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NTMKE4890NT3G

Onsemi

NTMKE4890NT3G by Onsemi

NTMKE4890NT3G by Onsemi is a N-CHANNEL FET with 30V DS Breakdown Voltage, 237A IDM, and 0.00245 ohm RDS(on). Ideal for SWITCHING applications, it operates in ENHANCEMENT MODE with a max power dissipation of 100W.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 1,323 parts In-Stock

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Vyrian

USA . 1,179 parts In-Stock

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Kulean Microsystems

USA . 6,763 parts In-Stock

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Problanco Electronics

Mexico . 3,604 parts In-Stock

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TANS Electronics

Latvia . 2,526 parts In-Stock

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Corphita

USA . 1,601 parts In-Stock

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SupplyDigital Components

Austria . 1,574 parts In-Stock

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Corohmni

South Africa . 194 parts In-Stock

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UHIMA Technologies

Türkiye . 183 parts In-Stock

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Overview

Discover the power and efficiency of the NTMKE4890NT3G by Onsemi, a top-quality N-CHANNEL Power Field Effect Transistor with a built-in diode for enhanced performance. Ideal for switching applications, this single configuration transistor offers a maximum pulsed drain current of 237A and a low on-resistance of 0.00245 ohm for optimal functionality. Embrace the reliability and versatility of Onsemi's advanced technology, providing customers with a high-performance solution for their power management needs. Upgrade your systems with the NTMKE4890NT3G and experience the benefits of superior quality and efficiency.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are more efficient and can handle higher currents, making them suitable for high power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode allows for easier circuit design and protection against reverse voltage.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast and efficient operation.

Minimum DS Breakdown Voltage: 30 V

With a higher breakdown voltage, this FET can handle higher voltages without damage.

Surface Mount: YES

Surface mount package makes it easier to integrate into modern electronic designs.

Maximum Pulsed Drain Current (IDM): 237 A

Capable of handling high pulsed currents, ideal for applications where spikes in current occur.

Maximum Power Dissipation (Abs): 100 W

High power dissipation capability allows for efficient operation at high power levels.

Maximum Operating Temperature: 150 °C

Can operate at high temperatures without performance degradation, suitable for harsh environments.

Technical Specifications

Power Field Effect Transistors (FET) NTMKE4890NT3G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

505 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

192 A

Maximum Drain Current (ID):

30 A

Maximum Drain-Source On Resistance:

.00245 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XBCC-N3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

CHIP CARRIER

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

237 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

NO LEAD

Terminal Position:

BOTTOM

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMKE4890NT3G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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