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NTLJS3D0N02P8TAG

Onsemi

NTLJS3D0N02P8TAG by Onsemi

NTLJS3D0N02P8TAG by Onsemi is a N-CHANNEL FET with 20V DS Breakdown Voltage, ideal for SWITCHING applications. It features a max ID of 12.1A and 0.0055 ohm RDS(ON), operating in the -55 to 150 °C temperature range. This SMALL OUTLINE transistor has DUAL terminals and a DRAIN connection, suitable for ENHANCEMENT MODE operations.

Median Price

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Lifecycle Status

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1k+

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TANS Electronics

Latvia . 5,110 parts In-Stock

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SupplyDigital Components

Austria . 4,018 parts In-Stock

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Corphita

USA . 1,885 parts In-Stock

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Kulean Microsystems

USA . 803 parts In-Stock

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UHIMA Technologies

Türkiye . 362 parts In-Stock

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Problanco Electronics

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Corohmni

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Overview

Unlock the power of cutting-edge technology with the NTLJS3D0N02P8TAG by Onsemi. As a leader in the industry, Onsemi delivers top-quality Small Signal Field Effect Transistors that are perfect for switching applications. With a single configuration and built-in diode, this N-CHANNEL transistor offers unparalleled performance and reliability. Say goodbye to outdated technology and welcome enhanced efficiency with this innovative solution. Trust Onsemi's expertise and elevate your projects to new heights with the NTLJS3D0N02P8TAG.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the transistor, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

Offers efficient performance for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design and saves space by integrating a diode within the transistor.

Transistor Application: SWITCHING

Designed specifically for switching operations, ensuring reliable performance in such applications.

Surface Mount: YES

Allows for easy and convenient installation on circuit boards.

Minimum DS Breakdown Voltage: 20 V

Offers a sufficient breakdown voltage for handling various voltage levels.

Package Shape: SQUARE

Helps in efficient placement and mounting on circuit boards.

Operating Mode: ENHANCEMENT MODE

Enhances the overall performance of the transistor in its operating mode.

Maximum Power Dissipation (Abs): 2.4 W

Can handle relatively high power dissipation, making it suitable for demanding applications.

Package Style (Meter): SMALL OUTLINE

Occupies less space on the circuit board, allowing for compact designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizes MOSFET technology for efficient operation and performance.

Maximum Operating Temperature: 150 °C

Can withstand high operating temperatures, increasing its versatility in different environments.

Transistor Element Material: SILICON

Provides reliability and consistent performance as a semiconductor material.

Minimum Operating Temperature: -55 °C

Capable of operating in low-temperature environments, expanding its range of applications.

Maximum Drain Current (ID): 12.1 A

With a high maximum drain current, it can handle large current loads effectively.

Maximum Drain-Source On Resistance: 0.0055 ohm

Low on-resistance helps in minimizing power loss and improving efficiency.

Terminal Position: DUAL

Allows for versatile connection options in circuit designs.

Case Connection: DRAIN

Utilizes drain connection for easy integration into circuits.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTLJS3D0N02P8TAG attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

ULTRA LOW RESISTANCE

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (ID):

12.1 A

Maximum Drain-Source On Resistance:

.0055 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

S-PDSO-N3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

SQUARE

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Surface Mount:

YES

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTLJS3D0N02P8TAG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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