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NTHD5902T1

Onsemi

NTHD5902T1 by Onsemi

NTHD5902T1 by Onsemi is a N-CHANNEL FET with 2 elements, built-in diode for SWITCHING applications. Features include 30V DS Breakdown Voltage, 2.9A Drain Current, and 0.085 ohm On Resistance. Ideal for small outline packages in high-temp environments up to 150 °C.

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1k+

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Component Stockers USA

USA . 739 parts In-Stock

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TANS Electronics

Latvia . 7,502 parts In-Stock

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Kulean Microsystems

USA . 7,167 parts In-Stock

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Problanco Electronics

Mexico . 5,849 parts In-Stock

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SupplyDigital Components

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Corphita

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UHIMA Technologies

Türkiye . 271 parts In-Stock

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Overview

Unleash the power of innovation with the Onsemi NTHD5902T1 small signal Field Effect Transistor. Manufactured by industry leader Onsemi, this N-CHANNEL transistor offers exceptional quality and reliability for switching applications. With a maximum drain current of 2.9A and a low drain-source on resistance of 0.085 ohm, this transistor delivers superior performance in a compact package. Say goodbye to limitations and hello to endless possibilities with the NTHD5902T1 – the ultimate solution for your electronic needs.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher electron mobility and faster switching speeds, making them ideal for high-performance applications.

Configuration: SEPARATE, 2 ELEMENTS WITH BUILT-IN DIODE

This configuration allows for more versatility in circuit design and can provide added functionality with the built-in diode.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring reliable and efficient performance in switching circuits.

Surface Mount: YES

Surface mount technology allows for easy and compact PCB assembly, making the product suitable for small footprint designs.

Minimum DS Breakdown Voltage: 30 V

The high breakdown voltage ensures that the FET can handle higher voltage levels, increasing the robustness of the circuit.

Package Shape: RECTANGULAR

Rectangular package shape provides efficient use of board space and allows for easy mounting on PCBs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer simple control and fast switching, making them suitable for a wide range of applications.

Maximum Drain Current (ID): 2.9 A

High drain current rating allows the FET to handle high current loads, making it suitable for power circuits.

Maximum Power Dissipation: 2.1 W

With a high power dissipation rating, the FET can handle power efficiently and reliably without overheating.

Package Style (Meter): SMALL OUTLINE

Small outline package style saves board space and facilitates high-density PCB designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers low noise, high input impedance, and low power consumption, making it suitable for sensitive applications.

Maximum Operating Temperature: 150 °C

High operating temperature range ensures reliable performance in harsh environments and high-temperature conditions.

Transistor Element Material: SILICON

Silicon FETs offer excellent electronic properties such as high mobility and thermal stability, ensuring reliable performance.

Terminal Finish: TIN LEAD

Tin-lead terminal finish provides good solderability and reliability in electronic assemblies.

Maximum Drain-Source On Resistance: 0.085 ohm

Low drain-source on resistance reduces power loss and improves efficiency in switching applications.

Terminal Position: DUAL

Dual terminal position allows for easy and flexible connection in circuit layouts.

Peak Reflow Temperature °C: 235

High peak reflow temperature ensures reliable solder joints during assembly and rework processes.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTHD5902T1 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

2.9 A

Maximum Drain Current (ID):

2.9 A

Maximum Drain-Source On Resistance:

.085 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XDSO-C8

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

C BEND

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTHD5902T1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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