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NTHD4N02FT1G

Onsemi

NTHD4N02FT1G by Onsemi

NTHD4N02FT1G by Onsemi is a N-CHANNEL FET with 20V DS Breakdown Voltage, 2.7A Drain Current, and 0.08ohm On Resistance. Ideal for SWITCHING applications due to its ENHANCEMENT MODE operation and built-in diode. Operates at up to 125 °C with a peak reflow temperature of 260°C in small outline package style.

Median Price

$0.195

Lifecycle Status

Suppliers In-Stock

10

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 238,224 parts In-Stock

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$0.170

100+ parts

$0.170

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$0.160

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238,224

$0.170

$0.170

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Verical

USA . 222,917 parts In-Stock

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$0.220

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$0.220

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Digiode

USA . 142 parts In-Stock

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$0.185

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142

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Chip Stock

USA . 68,000 parts In-Stock

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68,000

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Vyrian

USA . 10,410 parts In-Stock

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Microfarads

USA . 5,670 parts In-Stock

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5,670

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ComSIT Distribution GmbH

Germany . 3,000 parts In-Stock

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3,000

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Bristol Electronics

USA . 2,900 parts In-Stock

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2,900

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Flex Direct, LLC

USA . 2,900 parts In-Stock

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Avant Electronics Limited

UK . 2,250 parts In-Stock

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Distributors (Availability)

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Corphita

USA . 141 parts In-Stock

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$0.176

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Corohmni

South Africa . 373 parts In-Stock

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$0.195

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373

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AZTECH Wire

Italy . 661 parts In-Stock

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$20.440

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Continental Prestige Electronics

USA . 238,224 parts In-Stock

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$0.179

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Perfect Parts

USA . 15,624 parts In-Stock

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Problanco Electronics

Mexico . 8,333 parts In-Stock

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Kulean Microsystems

USA . 7,086 parts In-Stock

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A-Z Elektronik GmbH

Germany . 6,720 parts In-Stock

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6,720

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Authorized Procurement Solutions

USA . 5,000 parts In-Stock

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SupplyDigital Components

Austria . 3,234 parts In-Stock

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GreenTree Electronics

Israel . 2,750 parts In-Stock

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TANS Electronics

Latvia . 1,926 parts In-Stock

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UHIMA Technologies

Türkiye . 90 parts In-Stock

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Overview

Unlock the power of innovation with the NTHD4N02FT1G by Onsemi. Designed with precision and quality in mind, this small signal field effect transistor is perfect for a variety of switching applications. With its N-channel configuration and built-in diode, this transistor offers enhanced performance and reliability. Experience seamless operation and efficiency with a maximum drain current of 2.7A and a low drain-source on resistance of 0.08 ohm. Trust in Onsemi's expertise and elevate your projects to new heights with the NTHD4N02FT1G.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-resistance and higher current-carrying capabilities compared to P-channel FETs, making them a good choice for switching applications.

Minimum DS Breakdown Voltage: 20 V

This high breakdown voltage allows for reliable operation in applications where higher voltages may be present.

Maximum Drain Current (ID): 2.9 A

With a high maximum drain current, this FET can handle larger current loads, making it suitable for applications that require higher power switching.

Maximum Power Dissipation (Abs): 0.91 W

With a relatively high maximum power dissipation rating, this FET can handle heat well and operate reliably in challenging conditions.

Maximum Operating Temperature: 125 °C

The high maximum operating temperature allows for operation in a wide range of environments, making this FET versatile and reliable.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTHD4N02FT1G attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

2.7 A

Maximum Drain Current (ID):

2.9 A

Maximum Drain-Source On Resistance:

.08 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

50 pF

JESD-30 Code:

R-XDSO-C8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

125 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

C BEND

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTHD4N02FT1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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