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NTHD5904NT1

Onsemi

NTHD5904NT1 by Onsemi

NTHD5904NT1 by Onsemi is a N-CHANNEL FET with 2 elements & built-in diode, ideal for switching applications. Features include: Max Drain Current of 3.3A, Min DS Breakdown Voltage of 20V, and Max Power Dissipation of 1.13W. Its small outline package style & max operating temp of 150 °C make it suitable for various electronic designs.

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3

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1k+

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AZTECH Wire

Italy . 350 parts In-Stock

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Component Stockers USA

USA . 769 parts In-Stock

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Kulean Microsystems

USA . 6,924 parts In-Stock

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SupplyDigital Components

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TANS Electronics

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A-Z Elektronik GmbH

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RC Electronics

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Overview

Unleash the power of cutting-edge technology with the NTHD5904NT1 by Onsemi. Crafted by a trusted manufacturer, this small signal field effect transistor offers unparalleled quality and reliability. Ideal for switching applications, this N-CHANNEL transistor features 2 separate elements with a built-in diode, maximizing efficiency. With a maximum drain current of 3.3 A and a low on-resistance of 0.065 ohm, this transistor delivers exceptional performance. Experience seamless operation and superior functionality with the NTHD5904NT1, setting new standards in the world of electronics.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are generally more efficient and have lower resistance compared to P-channel FETs, making them a good choice for high performance applications.

Minimum DS Breakdown Voltage: 20 V

With a breakdown voltage of 20V, this FET can handle higher voltages without getting damaged, providing reliability in switching applications.

Maximum Drain Current (Abs): 3.3 A

With a high drain current rating of 3.3A, this FET can handle high current loads, making it suitable for switching applications where high power is required.

Maximum Power Dissipation (Abs): 1.13 W

The low power dissipation of 1.13W ensures that the FET operates efficiently and does not overheat, contributing to its reliability in various applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand high temperatures, making it suitable for applications where heat dissipation is a concern.

Maximum Drain-Source On Resistance: 0.065 ohm

The low drain-source on resistance of 0.065 ohm ensures minimal voltage drop across the FET when it is in the on state, maximizing efficiency in switching applications.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTHD5904NT1 attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

3.3 A

Maximum Drain Current (ID):

2.5 A

Maximum Drain-Source On Resistance:

.065 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XDSO-C8

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

C BEND

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTHD5904NT1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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