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NTD4959NHT4G

Onsemi

NTD4959NHT4G by Onsemi

NTD4959NHT4G by Onsemi is a Power FET with N-CHANNEL polarity, suitable for SWITCHING applications. It features a 30V DS Breakdown Voltage, 130A IDM, and 0.0125 ohm Drain-Source Resistance. With a built-in diode and GULL WING terminals, this MOSFET operates in ENHANCEMENT MODE for efficient power management in various electronic devices.

Median Price

$0.225

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 7,500 parts In-Stock

1+ parts

-

100+ parts

$0.225

1k+ parts

$0.186

10k+ parts

$0.166

7,500

-

$0.225

$0.186

$0.166

DigiKey

USA . 7,500 parts In-Stock

1+ parts

-

100+ parts

-

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-

10k+ parts

$0.280

7,500

-

-

-

$0.280

Verical

USA . 7,500 parts In-Stock

1+ parts

-

100+ parts

-

1k+ parts

-

10k+ parts

$0.208

7,500

-

-

-

$0.208

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 805 parts In-Stock

1+ parts

$0.175

100+ parts

-

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805

$0.175

-

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Chip Stock

USA . 66,000 parts In-Stock

1+ parts

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66,000

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Vyrian

USA . 6,841 parts In-Stock

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6,841

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Corphita

USA . 1,820 parts In-Stock

1+ parts

$0.166

100+ parts

-

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1,820

$0.166

-

-

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Corohmni

South Africa . 141 parts In-Stock

1+ parts

$0.184

100+ parts

-

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141

$0.184

-

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AZTECH Wire

Italy . 960 parts In-Stock

1+ parts

$15.520

100+ parts

-

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960

$15.520

-

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Kepictronics

USA . 10,000 parts In-Stock

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10,000

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Continental Prestige Electronics

USA . 7,500 parts In-Stock

1+ parts

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100+ parts

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$0.169

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7,500

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$0.169

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Kulean Microsystems

USA . 6,775 parts In-Stock

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6,775

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SupplyDigital Components

Austria . 5,106 parts In-Stock

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5,106

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Problanco Electronics

Mexico . 2,705 parts In-Stock

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2,705

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TANS Electronics

Latvia . 1,751 parts In-Stock

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1,751

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UHIMA Technologies

Türkiye . 440 parts In-Stock

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440

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Overview

Discover the power of the NTD4959NHT4G by Onsemi, a top-quality Power Field Effect Transistor that guarantees optimal performance in switching applications. Crafted with precision and expertise by Onsemi, this N-CHANNEL transistor boasts a single configuration with a built-in diode, offering unparalleled efficiency and reliability. With a maximum drain current of 9A and a low on-resistance of 0.0125 ohm, this transistor is a game-changer for your power management needs. Trust Onsemi's expertise and elevate your electronic designs with the NTD4959NHT4G.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic/epoxy package material offers durability and protection to the FET, making it reliable for long-term use.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are commonly used for high-performance applications due to their lower resistance and faster switching speed.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient performance in various electronic circuits.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer higher switching speed and lower on-state resistance, making them suitable for high-frequency applications.

Maximum Pulsed Drain Current (IDM): 130 A

High maximum pulsed drain current capability allows for handling sudden spikes in power, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 112.5 mJ

With a high avalanche energy rating, the FET can withstand transient voltage spikes without damage, ensuring reliable operation in harsh conditions.

Maximum Drain Current (ID): 9 A

The high maximum drain current rating allows for handling higher power loads, making it suitable for various power applications.

Maximum Drain-Source On Resistance: 0.0125 ohm

Low on-state resistance leads to lower power losses and higher efficiency in power switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD4959NHT4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

112.5 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (ID):

9 A

Maximum Drain-Source On Resistance:

.0125 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

130 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD4959NHT4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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