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NTD2955G

Onsemi

NTD2955G by Onsemi

NTD2955G by Onsemi is a P-CHANNEL FET with 60V DS Breakdown Voltage, 36A IDM, and 0.18 ohm RDS. Ideal for SWITCHING applications, it operates in ENHANCEMENT MODE with a max power dissipation of 55W. The transistor has a SILICON element material and can withstand temperatures up to 175°C.

Median Price

$1.034

Lifecycle Status

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In-Stock Inventory

1k+

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USA . 22,500 parts In-Stock

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Nova Conductors

Japan . 300 parts In-Stock

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$0.359

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Forefront Electronics and Design

USA . 69 parts In-Stock

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Chip Stock

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Vyrian

USA . 6,078 parts In-Stock

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Sternenhof Electronics

Switzerland . 3,525 parts In-Stock

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Digiode

USA . 1,699 parts In-Stock

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ComSIT Distribution GmbH

Germany . 297 parts In-Stock

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Bristol Electronics

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Atlantic Semiconductor

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Sea View Technologies

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Ashlea Components Ltd

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Sensible Micro Corp

USA . 30 parts In-Stock

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$1.034

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$0.954

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ACDS - Activité Composants Distribution Service

France . 28 parts In-Stock

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QIE Inc.

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Cyclops Electronics Ltd

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EMSNET

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Continental Prestige Electronics

USA . 2,059 parts In-Stock

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$0.207

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$0.203

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$0.207

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Argo Parts USA

USA . 1,631 parts In-Stock

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$0.207

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$0.201

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Advanced Electronics

New Zealand . 270 parts In-Stock

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$0.211

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Benley Electronics

USA . 75 parts In-Stock

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Corohmni

South Africa . 171 parts In-Stock

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Netroflash

USA . 1,000 parts In-Stock

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$0.359

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Aztec Data Supply Inc.

USA . 24 parts In-Stock

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$1.690

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AZTECH Wire

Italy . 781 parts In-Stock

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Semicontronic

India . 22,162 parts In-Stock

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$29.299

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Ampacity Inc.

Singapore . 22,487 parts In-Stock

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Lixinc

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Kulean Microsystems

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Latvia . 1,551 parts In-Stock

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Austria . 1,425 parts In-Stock

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Problanco Electronics

Mexico . 1,002 parts In-Stock

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UHIMA Technologies

Türkiye . 349 parts In-Stock

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Perfect Parts

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Glotronic Ltd.

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Overview

Unleash the power of innovation with the NTD2955G by Onsemi. Crafted with precision and expertise, this P-CHANNEL Power Field Effect Transistor (FET) is designed to elevate your switching applications to new heights. With a built-in diode and an impressive 36 A pulsed drain current, this transistor offers unparalleled performance and reliability. Whether you're in the automotive, industrial, or consumer electronics industry, the NTD2955G delivers exceptional value, efficiency, and convenience. Upgrade your projects with Onsemi's top-notch technology and experience the difference today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic/epoxy packaging provides durability and protection for the transistor, ensuring long-term reliability.

Polarity or Channel Type: P-CHANNEL

P-channel FETs have lower on-resistance and can handle higher current compared to N-channel FETs, making them suitable for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode allows for faster switching speeds and better efficiency in applications where reverse current flow needs to be managed.

Transistor Application: SWITCHING

Designed for switching applications, offering high efficiency and fast response times.

Surface Mount: YES

Surface mount package allows for easy and convenient PCB assembly, saving space and reducing overall product size.

Minimum DS Breakdown Voltage: 60 V

High breakdown voltage ensures reliable operation in high voltage applications, providing a safety margin for the device.

Maximum Pulsed Drain Current (IDM): 36 A

High pulsed drain current rating allows the FET to handle large current spikes without damage, making it suitable for high-power applications.

Maximum Power Dissipation (Abs): 55 W

High power dissipation rating ensures the FET can handle high power levels without overheating, improving its overall reliability.

Maximum Operating Temperature: 175 °C

Wide operating temperature range allows the FET to be used in various environmental conditions, enhancing its versatility.

Technical Specifications

Power Field Effect Transistors (FET) NTD2955G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

216 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.18 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

36 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD2955G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.75

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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