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NTD12N10T4G

Onsemi

NTD12N10T4G by Onsemi

NTD12N10T4G by Onsemi is a Power FET with N-CHANNEL polarity, suitable for SWITCHING applications. It features a 100V DS Breakdown Voltage, 36A Max Pulsed Drain Current, and 0.165 ohm Max Drain-Source Resistance. Ideal for high-power switching circuits in various electronic devices.

Median Price

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Lifecycle Status

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4

In-Stock Inventory

1k+

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Chip Stock

USA . 16,000 parts In-Stock

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Vyrian

USA . 11,614 parts In-Stock

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ComSIT Distribution GmbH

Germany . 1,630 parts In-Stock

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Digiode

USA . 646 parts In-Stock

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AZTECH Wire

Italy . 841 parts In-Stock

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$9.680

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841

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Authorized Procurement Solutions

USA . 25,000 parts In-Stock

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Kepictronics

USA . 23,524 parts In-Stock

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Futuretech Components

Singapore . 9,000 parts In-Stock

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Assy Fe

Spain . 6,500 parts In-Stock

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TANS Electronics

Latvia . 3,196 parts In-Stock

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Corphita

USA . 2,377 parts In-Stock

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Problanco Electronics

Mexico . 1,766 parts In-Stock

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A-Z Elektronik GmbH

Germany . 1,740 parts In-Stock

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Kulean Microsystems

USA . 1,537 parts In-Stock

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Corohmni

South Africa . 230 parts In-Stock

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SupplyDigital Components

Austria . 205 parts In-Stock

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UHIMA Technologies

Türkiye . 150 parts In-Stock

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Overview

Experience superior performance and reliability with the Onsemi NTD12N10T4G Power Field Effect Transistor. Manufactured by industry leader Onsemi, this N-CHANNEL transistor is perfect for switching applications, offering enhanced efficiency and durability. With a maximum operating temperature of 175 °C and a minimum DS breakdown voltage of 100V, this transistor ensures optimal functionality even in demanding conditions. Trust Onsemi's expertise and elevate your projects with the NTD12N10T4G - the perfect choice for quality and performance.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material ensures durability and protection for the transistor, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-resistance, higher current handling capabilities, and better performance than P-channel FETs.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides protection against reverse polarity and allows for more efficient switching operations.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring high performance and reliability in such scenarios.

Minimum DS Breakdown Voltage: 100 V

This high breakdown voltage allows for safe operation in high voltage applications without the risk of damage.

Surface Mount: YES

Surface mount technology offers space-saving and efficient PCB design options, ideal for compact electronic devices.

Maximum Pulsed Drain Current (IDM): 36 A

High pulsed drain current rating allows for handling sudden surges in current without damage to the transistor.

Maximum Power Dissipation (Abs): 56.6 W

High power dissipation rating ensures the FET can handle high power applications without overheating.

Maximum Operating Temperature: 175 °C

The high operating temperature range allows for reliable operation in a wide range of environmental conditions.

Technical Specifications

Power Field Effect Transistors (FET) NTD12N10T4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

75 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.165 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

36 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD12N10T4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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