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MTD6P10ET4

Onsemi

MTD6P10ET4 by Onsemi

MTD6P10ET4 by Onsemi is a P-CHANNEL FET with 100V DS Breakdown Voltage, 18A IDM, and 0.66 ohm RDS. Ideal for SWITCHING applications in ENHANCEMENT MODE, it features a built-in DIODE and operates at up to 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Digiode

USA . 2,166 parts In-Stock

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Vyrian

USA . 1,009 parts In-Stock

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EMSNET

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Authorized Procurement Solutions

USA . 15,000 parts In-Stock

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SupplyDigital Components

Austria . 7,686 parts In-Stock

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TANS Electronics

Latvia . 4,986 parts In-Stock

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Kepictronics

USA . 4,100 parts In-Stock

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Kulean Microsystems

USA . 1,820 parts In-Stock

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Corphita

USA . 1,294 parts In-Stock

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UHIMA Technologies

Türkiye . 823 parts In-Stock

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Corohmni

South Africa . 350 parts In-Stock

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Problanco Electronics

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Overview

Unleash the power of innovation with the MTD6P10ET4 by Onsemi, a top-tier manufacturer known for delivering superior quality products. This P-Channel Power Field Effect Transistor is a game-changer in the industry, offering seamless switching capabilities and high-performance enhancements. Ideal for a wide range of applications, this transistor provides reliable and efficient operation, making it a valuable asset for customers looking to elevate their projects to the next level. Trust in Onsemi to deliver excellence with the MTD6P10ET4.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material offers durability and protection to the internal components of the power FET, ensuring a longer lifespan for the product.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low on-resistance and higher current-carrying capacities, making this product efficient for switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this power FET provides reliable performance and efficiency in controlling power flow.

Minimum DS Breakdown Voltage: 100 V

With a high breakdown voltage, this power FET can handle high voltage applications, ensuring safety and reliability in operation.

Maximum Pulsed Drain Current (IDM): 18 A

The high pulsed drain current rating allows this power FET to handle sudden surges in current, making it suitable for demanding applications.

Maximum Power Dissipation (Abs): 50 W

With a high power dissipation rating, this power FET can handle heat efficiently, ensuring stable performance in high-power applications.

Maximum Operating Temperature: 150 °C

The high operating temperature of 150 °C allows this power FET to operate in harsh environments without compromising performance.

Technical Specifications

Power Field Effect Transistors (FET) MTD6P10ET4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

180 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

6 A

Maximum Drain Current (ID):

6 A

Maximum Drain-Source On Resistance:

.66 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

18 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTD6P10ET4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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