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MTD6N15T4G

Onsemi

MTD6N15T4G by Onsemi

MTD6N15T4G by Onsemi is a N-CHANNEL FET with 150V DS Breakdown Voltage, 20A IDM, and 0.3 ohm RDS(ON). Ideal for SWITCHING applications, it operates in ENHANCEMENT MODE with 6A ID. The PLASTIC/EPOXY package features GULL WING terminals and can handle up to 20W power dissipation.

Median Price

$1.275

Lifecycle Status

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Component Electronics Inc.

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Nova Conductors

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Bristol Electronics

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Cyclops Electronics Ltd

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LWI Electronics Inc

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LittleDiode

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Benley Electronics

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Corohmni

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AZTECH Wire

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Component Stockers USA

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Overview

Enhance your power system with the MTD6N15T4G by Onsemi, a top-of-the-line Power FET that delivers unmatched quality and reliability. Manufactured by industry leader Onsemi, this N-CHANNEL transistor offers superior performance in switching applications, making it ideal for a wide range of uses. With a maximum drain current of 6A and a low on-resistance of 0.3 ohm, this transistor provides exceptional value and efficiency. Upgrade your power systems today with the MTD6N15T4G and experience the benefits of top-notch technology at your fingertips.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the transistor, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have higher electron mobility and faster switching speeds compared to P-channel transistors.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for reliable and efficient switching operations in the circuit.

Transistor Application: SWITCHING

Designed for efficient switching applications, ensuring reliable performance.

Surface Mount: YES

Easy to mount on printed circuit boards, saving space and facilitating automated assembly processes.

Minimum DS Breakdown Voltage: 150 V

Can handle high voltage applications with a minimum breakdown voltage of 150 V.

Package Shape: RECTANGULAR

Compact design for efficient use of space on the circuit board.

Terminal Form: GULL WING

Provides strong and reliable solder connections for improved performance.

Operating Mode: ENHANCEMENT MODE

Enhancement mode transistors offer high input impedance and can be easily turned on and off.

Maximum Pulsed Drain Current (IDM): 20 A

Capable of handling high peak currents during pulsed operations without damage.

Maximum Power Dissipation (Abs): 20 W

Can dissipate up to 20 watts of power without overheating, suitable for high-power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Provides reliable and efficient operation for switching applications.

Maximum Operating Temperature: 150 °C

Can operate at high temperatures up to 150 °C, ensuring reliability in harsh environments.

Minimum Operating Temperature: -65 °C

Capable of operating in extreme cold temperatures as low as -65 °C.

Terminal Finish: TIN

Tin finish offers good solderability and corrosion resistance for long-term reliability.

Maximum Drain-Source On Resistance: 0.3 ohm

Low on-resistance results in minimal power loss and improved efficiency in switching operations.

Terminal Position: SINGLE

Simplified circuit integration with only one terminal position.

Case Connection: DRAIN

Allows for efficient connection to the circuit, enhancing overall performance.

Maximum Time At Peak Reflow Temperature (s): 30

Can withstand high peak reflow temperatures for a maximum of 30 seconds during assembly processes.

Peak Reflow Temperature °C: 260

Capable of withstanding peak reflow temperatures of up to 260 °C during soldering processes.

Technical Specifications

Power Field Effect Transistors (FET) MTD6N15T4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

150 V

Maximum Drain Current (Abs) (ID):

6 A

Maximum Drain Current (ID):

6 A

Maximum Drain-Source On Resistance:

.3 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-65 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

20 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTD6N15T4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.75

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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