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MTD6P10EG

Onsemi

MTD6P10EG by Onsemi

MTD6P10EG by Onsemi is a P-CHANNEL FET with 100V DS Breakdown Voltage, 18A IDM, and 0.66 ohm RDS(on). Ideal for SWITCHING applications, it features ENHANCEMENT MODE operation in a SMALL OUTLINE package. With 180 mJ EAS rating and 50W power dissipation, this transistor is suitable for high-power circuit designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 1,203 parts In-Stock

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Vyrian

USA . 908 parts In-Stock

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TANS Electronics

Latvia . 7,293 parts In-Stock

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Kulean Microsystems

USA . 5,674 parts In-Stock

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Problanco Electronics

Mexico . 2,537 parts In-Stock

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Corphita

USA . 2,160 parts In-Stock

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Corohmni

South Africa . 344 parts In-Stock

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SupplyDigital Components

Austria . 323 parts In-Stock

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UHIMA Technologies

Türkiye . 177 parts In-Stock

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Overview

Upgrade your power management solutions with the MTD6P10EG by Onsemi. This P-CHANNEL Power FET offers reliable performance for switching applications, ensuring efficient operation and optimal power distribution. With a maximum pulsing drain current of 18A and a breakdown voltage of 100V, this transistor is built to handle high-power requirements with ease. Whether you're looking to enhance your circuit efficiency or improve overall performance, the MTD6P10EG provides the quality and reliability you need. Trust Onsemi's expertise in semiconductor technology and elevate your projects to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the transistor, making it suitable for various applications.

Polarity or Channel Type: P-CHANNEL

Offers lower resistance and higher current handling capabilities compared to N-Channel transistors, making it suitable for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design by already including a diode within the transistor package.

Transistor Application: SWITCHING

Optimized for switching operations, providing efficient control over current flow.

Surface Mount: YES

Facilitates easy and secure mounting on circuit boards, enhancing the overall functionality of the product.

Minimum DS Breakdown Voltage: 100 V

Allows for operation in higher voltage applications, ensuring reliable performance under varying conditions.

Maximum Pulsed Drain Current (IDM): 18 A

Capable of handling high current pulses, making it suitable for demanding applications.

Maximum Power Dissipation (Abs): 50 W

High power dissipation capability, enabling the transistor to operate efficiently without overheating.

Maximum Operating Temperature: 150 °C

Can withstand high operating temperatures, making it suitable for industrial and automotive applications.

Technical Specifications

Power Field Effect Transistors (FET) MTD6P10EG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

180 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

6 A

Maximum Drain Current (ID):

6 A

Maximum Drain-Source On Resistance:

.66 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

18 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTD6P10EG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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