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MTD6P10ET4G

Onsemi

MTD6P10ET4G by Onsemi

MTD6P10ET4G by Onsemi is a P-CHANNEL FET with 100V DS Breakdown Voltage, 18A IDM, and 0.66 ohm RDS(on). Ideal for SWITCHING applications in ENHANCEMENT MODE operation. Features GULL WING terminals, 50W power dissipation, and operates up to 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 1,851 parts In-Stock

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Vyrian

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Problanco Electronics

Mexico . 5,936 parts In-Stock

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Kulean Microsystems

USA . 3,676 parts In-Stock

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SupplyDigital Components

Austria . 2,444 parts In-Stock

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TANS Electronics

Latvia . 1,806 parts In-Stock

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Perfect Parts

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Corohmni

South Africa . 188 parts In-Stock

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Corphita

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UHIMA Technologies

Türkiye . 84 parts In-Stock

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Overview

Unlock the power of the MTD6P10ET4G by Onsemi, a high-quality P-Channel Power Field Effect Transistor designed for switching applications. With a maximum drain current of 6A and a breakdown voltage of 100V, this transistor delivers exceptional performance in a compact package. Manufactured by Onsemi, a trusted leader in semiconductor technology, this transistor offers reliability and efficiency. Ideal for a wide range of applications, from automotive to industrial, the MTD6P10ET4G provides outstanding value and performance, making it the perfect choice for your next project. Trust Onsemi for quality you can rely on.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durable and reliable protection for the internal components of the FET.

Polarity or Channel Type: P-CHANNEL

Can be used effectively in circuits where P-channel FETs are preferred.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design and saves space by including a diode within the FET package.

Transistor Application: SWITCHING

Designed to efficiently switch high currents, making it suitable for a variety of applications.

Minimum DS Breakdown Voltage: 100 V

Capable of handling high voltages, increasing the versatility of the FET.

Surface Mount: YES

Facilitates easy and efficient mounting on circuit boards.

Maximum Pulsed Drain Current (IDM): 18 A

Can handle high current spikes without damage, ensuring reliable performance.

Avalanche Energy Rating (EAS): 180 mJ

Provides protection against high energy spikes, enhancing the durability of the FET.

Maximum Drain-Source On Resistance: 0.66 ohm

Offers low on-resistance for efficient power handling and minimal power loss.

Technical Specifications

Power Field Effect Transistors (FET) MTD6P10ET4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

180 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

6 A

Maximum Drain Current (ID):

6 A

Maximum Drain-Source On Resistance:

.66 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

18 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

MTD6P10ET4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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