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FQD5N50CTM-WS

Onsemi

FQD5N50CTM-WS by Onsemi

FQD5N50CTM-WS by Onsemi is a N-CHANNEL Power FET with 500V DS Breakdown Voltage. It features 16A IDM, 1.4 ohm RDS(on), and 300mJ EAS, ideal for SWITCHING applications. This SINGLE transistor in PLASTIC package with GULL WING terminals operates in ENHANCEMENT MODE for efficient performance.

Median Price

$0.966

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (Authorized)

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Flip Electronics (Authorized)

USA . 761 parts In-Stock

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761

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Verical

USA . 534 parts In-Stock

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$0.901

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534

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$0.901

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Rochester

USA . 1 parts In-Stock

1+ parts

-

100+ parts

$1.030

1k+ parts

$0.855

10k+ parts

$0.762

1

-

$1.030

$0.855

$0.762

Distributors (In-Stock)

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Vyrian

USA . 2,721 parts In-Stock

1+ parts

$0.713

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$0.713

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Digiode

USA . 990 parts In-Stock

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$0.806

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990

$0.806

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Flip Electronics

USA . 761 parts In-Stock

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761

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Distributors (Availability)

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Corohmni

South Africa . 455 parts In-Stock

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$0.713

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455

$0.713

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Corphita

USA . 2,096 parts In-Stock

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$0.763

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$0.763

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QUARKTWIN TECHNOLOGY LTD

USA . 13,520 parts In-Stock

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SupplyDigital Components

Austria . 8,060 parts In-Stock

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TANS Electronics

Latvia . 7,495 parts In-Stock

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Kulean Microsystems

USA . 4,611 parts In-Stock

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Glotronic Ltd.

UK . 3,900 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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Continental Prestige Electronics

USA . 2,500 parts In-Stock

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$1.020

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$1.020

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Problanco Electronics

Mexico . 2,390 parts In-Stock

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Supply Digital

USA . 1,138 parts In-Stock

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Northwest PG Solutions

USA . 1,088 parts In-Stock

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$4.607

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Native Components

USA . 850 parts In-Stock

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$4.560

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850

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UHIMA Technologies

Türkiye . 504 parts In-Stock

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504

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Overview

Enhance your power switching applications with the FQD5N50CTM-WS by Onsemi. Crafted with precision and expertise, this N-channel Power FET offers a seamless performance with its built-in diode configuration. Perfect for various industrial and electronic applications, this transistor guarantees reliability and efficiency. Trust in the quality of Onsemi to deliver exceptional products that add value to your projects. Upgrade your systems with the FQD5N50CTM-WS and experience the benefits of superior technology at your fingertips.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components, ensuring a longer lifespan for the product.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency compared to P-channel FETs, making them ideal for high-performance applications.

Minimum DS Breakdown Voltage: 500 V

High breakdown voltage ensures reliability and robustness in high-power applications, providing protection against voltage spikes.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer better control over the switching operation, allowing for precise and efficient power management.

Maximum Pulsed Drain Current (IDM): 16 A

High pulsed drain current capability allows for handling sudden surge currents without overheating, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 300 mJ

High avalanche energy rating ensures the FET can withstand sudden voltage spikes and transients without getting damaged, enhancing the reliability of the product.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology provides high-speed switching capabilities and low on-resistance, making it suitable for efficient power switching applications.

Maximum Drain Current (ID): 4 A

High drain current handling capability ensures the FET can handle the required current levels without overheating, making it reliable for a variety of applications.

Maximum Drain-Source On Resistance: 1.4 ohm

Low on-resistance leads to reduced power loss and improved efficiency in power switching applications, allowing for better performance and heat dissipation.

Technical Specifications

Power Field Effect Transistors (FET) FQD5N50CTM-WS attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

300 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (ID):

4 A

Maximum Drain-Source On Resistance:

1.4 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

16 A

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FQD5N50CTM-WS Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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