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FQD5N60C

Onsemi

FQD5N60C by Onsemi

FQD5N60C by Onsemi is a N-CHANNEL Power FET with 600V DS Breakdown Voltage and 2.5 ohm RDS(ON). Ideal for SWITCHING applications, it has a max IDM of 11.2A and EAS of 210mJ.

Median Price

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Lifecycle Status

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4

In-Stock Inventory

1k+

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Chip Stock

USA . 33,000 parts In-Stock

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Vyrian

USA . 959 parts In-Stock

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Digiode

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Nova Conductors

Japan . 100 parts In-Stock

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Aztec Data Supply Inc.

USA . 247 parts In-Stock

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$0.514

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Corohmni

South Africa . 161 parts In-Stock

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$0.923

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Ampacity Inc.

Singapore . 1,226 parts In-Stock

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$2.050

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AZTECH Wire

Italy . 278 parts In-Stock

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Kepictronics

USA . 27,860 parts In-Stock

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TANS Electronics

Latvia . 6,951 parts In-Stock

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A-Z Elektronik GmbH

Germany . 6,281 parts In-Stock

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Kulean Microsystems

USA . 4,439 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,187 parts In-Stock

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Supply Digital

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SupplyDigital Components

Austria . 2,096 parts In-Stock

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Aranea Global

USA . 2,000 parts In-Stock

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Continental Prestige Electronics

USA . 1,430 parts In-Stock

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Corphita

USA . 1,301 parts In-Stock

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Argo Parts USA

USA . 1,149 parts In-Stock

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Advanced Electronics

New Zealand . 1,045 parts In-Stock

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UHIMA Technologies

Türkiye . 504 parts In-Stock

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Problanco Electronics

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Overview

Experience the power of innovation with the FQD5N60C by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power FETs like no other. Ideal for switching applications, this N-CHANNEL transistor offers unmatched performance and reliability. With a maximum operating temperature of 150 °C and a minimum DS Breakdown Voltage of 600 V, the FQD5N60C is designed to exceed expectations. Embrace the future of technology and unlock endless possibilities with Onsemi's cutting-edge solutions.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package material provides durability and protection for the internal components of the FET, making it ideal for various industrial applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are commonly used in power applications due to their low ON resistance and high current capability, making this product suitable for high power switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast switching speeds and low ON resistance, enabling efficient power management in electronic circuits.

Minimum DS Breakdown Voltage: 600 V

With a high breakdown voltage of 600 V, this FET can handle high voltages safely, making it suitable for use in high power applications.

Maximum Pulsed Drain Current (IDM): 11.2 A

The high pulsed drain current rating of 11.2 A allows this FET to handle momentary high current demands, making it suitable for applications with dynamic power requirements.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150°C, this FET can withstand high-temperature environments, ensuring reliable performance in demanding conditions.

Technical Specifications

Power Field Effect Transistors (FET) FQD5N60C attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

210 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (ID):

2.8 A

Maximum Drain-Source On Resistance:

2.5 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

11.2 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

FQD5N60C Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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