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BLF6G22S-45,112

NXP Semiconductors

BLF6G22S-45,112 by NXP Semiconductors

BLF6G22S-45,112 by NXP Semiconductors is an N-channel enhancement mode FET designed for efficient power management. It features a max power dissipation of 2.5 W and operates up to 150 °C, making it ideal for high-performance applications in electronics. Its surface mount configuration ensures easy integration into compact designs.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 2,890 parts In-Stock

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Anansix

USA . 2,562 parts In-Stock

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Digiode

USA . 709 parts In-Stock

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One Stop Electronics

USA . 1,180 parts In-Stock

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$17.050

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$17.050

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AZTECH Wire

Italy . 846 parts In-Stock

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$20.560

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846

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Component Stockers USA

USA . 793 parts In-Stock

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$99.990

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QUARKTWIN TECHNOLOGY LTD

USA . 18,100 parts In-Stock

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UNI Independent Distributors

Spain . 7,407 parts In-Stock

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Corphita

USA . 1,364 parts In-Stock

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Native Components

USA . 949 parts In-Stock

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Northwest PG Solutions

USA . 581 parts In-Stock

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$4.469

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Overview

Unlock unparalleled efficiency and reliability with the BLF6G22S-45,112 from NXP Semiconductors. Renowned for their commitment to quality, NXP delivers this cutting-edge N-channel Power FET, designed for seamless integration in diverse applications—from RF amplification to industrial control systems. Experience enhanced performance and robust operation even under extreme conditions, ensuring your projects thrive with unmatched durability and precision. Choose excellence; choose NXP!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency, making them suitable for high-speed switching applications.

Configuration: SINGLE

Single configuration simplifies design and layout, making it easier for manufacturers and engineers to integrate into various circuits.

Surface Mount: YES

Surface mount capability allows for compact designs and improved performance in high-density applications by eliminating the need for through-hole soldering.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs have better off-state characteristics, which results in lower power consumption during idle states.

Maximum Power Dissipation (Abs): 2.5 W

A maximum power dissipation of 2.5 W allows the FET to handle substantial loads without overheating, making it suitable for power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance and fast switching speed, making the device efficient for switching applications.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C ensures reliability and performance in demanding environments or applications with high thermal loads.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G22S-45,112 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

BLF6G22S-45,112 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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