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BF1101WR,135

NXP Semiconductors

BF1101WR,135 by NXP Semiconductors

BF1101WR,135 by NXP Semiconductors is an N-channel MOSFET designed for efficient power management. It supports a max drain current of 0.03 A and operates up to 150 °C, making it ideal for high-temperature applications in compact electronics. Its surface mount configuration ensures easy integration into various circuits.

Median Price

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Suppliers In-Stock

3

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1k+

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Vyrian

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Digiode

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Anansix

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One Stop Electronics

USA . 1,599 parts In-Stock

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AZTECH Wire

Italy . 484 parts In-Stock

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Component Stockers USA

USA . 800 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

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UNI Independent Distributors

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Kepictronics

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Microchip USA

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Corphita

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Northwest PG Solutions

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Native Components

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Overview

Unlock superior performance with the BF1101WR,135 from NXP Semiconductors, a trusted leader in innovation. This high-quality N-channel power FET is designed for efficiency and reliability, making it perfect for diverse applications such as automotive and industrial systems. Its robust construction ensures exceptional thermal management, while its compact surface-mount design simplifies integration. Elevate your projects with NXP's commitment to excellence and innovation!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-Channel FETs are known for their high efficiency and performance in switching applications, making this product suitable for various electronic projects.

Configuration: SINGLE

A single configuration allows for simpler circuit designs and efficient use of space, perfect for compact applications.

Surface Mount: YES

Surface mount capability facilitates automated assembly and reduces the overall footprint, contributing to smaller device designs.

Maximum Drain Current (Abs) (ID): 0.03 A

A maximum drain current of 0.03 A is adequate for low-power applications, allowing for efficient control in small-scale electronics.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this FET ideal for battery-operated devices.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can operate reliably in demanding environments, increasing its versatility in various applications.

Terminal Finish: Matte Tin (Sn)

The matte tin finish provides good solderability, ensuring reliable connections and durability in electronic assemblies.

Maximum Drain Current (ID): 0.03 A

This duplicate specification reaffirms its suitability for low-power applications, ensuring consistency in performance across various setups.

Technical Specifications

Power Field Effect Transistors (FET) BF1101WR,135 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn)

Trade Compliance

BF1101WR,135 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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