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BF1102R,135

NXP Semiconductors

BF1102R,135 by NXP Semiconductors

BF1102R,135 by NXP Semiconductors is an N-channel MOSFET designed for surface mount applications. It features a max drain current of 0.04 A and operates in enhancement mode, withstanding temperatures up to 150 °C. Ideal for power management in electronic circuits.

Median Price

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Lifecycle Status

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3

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1k+

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Vyrian

USA . 8,648 parts In-Stock

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Digiode

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Anansix

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AZTECH Wire

Italy . 147 parts In-Stock

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One Stop Electronics

USA . 521 parts In-Stock

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$46.050

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UNI Independent Distributors

Spain . 7,790 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

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Northwest PG Solutions

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Native Components

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Microchip USA

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Overview

Unlock unparalleled performance with the BF1102R,135 from NXP Semiconductors, a leader in innovative solutions. This N-channel power FET delivers exceptional efficiency and reliability for your applications, ensuring seamless operation even under demanding conditions. With its robust design and surface mount capabilities, it’s perfect for everything from automotive to industrial systems. Choose NXP for quality you can trust, maximizing your project’s potential!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically offer lower on-resistance and faster switching speeds, making them ideal for high-efficiency applications.

Surface Mount: YES

Surface mount technology leads to improved circuit design flexibility, reduced space requirements, and better thermal performance.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs provide excellent control characteristics, allowing for better operation in digital and analog applications.

Maximum Drain Current (Abs): 0.04 A

With a maximum drain current capacity of 0.04 A, this FET is suitable for low-power applications, enhancing system reliability and efficiency.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers higher input impedance and faster switching speeds compared to other FET technologies, suitable for modern electronic designs.

Maximum Operating Temperature: 150 °C

A maximum operating temperature of 150 °C ensures reliability and performance in high-thermal environments, enhancing durability.

Terminal Finish: Tin (Sn)

Using a tin terminal finish promotes good solderability and resistance to corrosion, ensuring longevity and stability in connections.

Maximum Drain Current (ID): 0.04 A

Its drain current rating of 0.04 A aligns well with low-power applications, making it a versatile choice for various designs.

Technical Specifications

Power Field Effect Transistors (FET) BF1102R,135 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Maximum Drain Current (Abs) (ID):

.04 A

Maximum Drain Current (ID):

.04 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Trade Compliance

BF1102R,135 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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