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BF1105WR,135

NXP Semiconductors

BF1105WR,135 by NXP Semiconductors

BF1105WR,135 by NXP Semiconductors is an N-channel MOSFET designed for efficient power management. It supports a max drain current of 0.03 A and operates up to 150 °C, making it ideal for high-temperature applications in compact electronic devices. Its surface mount configuration ensures easy integration into various circuits.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 2,375 parts In-Stock

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Anansix

USA . 1,824 parts In-Stock

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Digiode

USA . 360 parts In-Stock

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360

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One Stop Electronics

USA . 1,317 parts In-Stock

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$14.050

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AZTECH Wire

Italy . 272 parts In-Stock

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$15.420

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QUARKTWIN TECHNOLOGY LTD

USA . 10,465 parts In-Stock

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UNI Independent Distributors

Spain . 4,947 parts In-Stock

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Corphita

USA . 4,699 parts In-Stock

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Native Components

USA . 990 parts In-Stock

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990

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Northwest PG Solutions

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482

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Microchip USA

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Overview

Unlock the potential of your designs with the BF1105WR,135 from NXP Semiconductors. Renowned for their commitment to quality and innovation, NXP provides a reliable N-channel FET that excels in efficiency and performance. Ideal for various applications, this surface-mount transistor ensures exceptional thermal stability and low power consumption, empowering engineers to create advanced solutions that enhance reliability and drive success in every project.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically provide higher efficiency and better performance in switching applications, making this product suitable for various electronic devices.

Configuration: SINGLE

A single configuration simplifies circuit design and reduces component count, leading to easier assembly and potentially lower costs.

Surface Mount: YES

Surface mount technology allows for compact designs and high-density circuit layouts, making it convenient for modern electronic applications.

Maximum Drain Current (Abs) (ID): 0.03 A

With a maximum drain current of 0.03 A, this FET is ideal for low-power applications, ensuring efficient operation without excessive heat generation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this FET suitable for a wide range of analog and digital applications.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature expands the usability of this FET in demanding environments, ensuring reliability under heat stress.

Terminal Finish: Tin (Sn)

The tin terminal finish enhances solderability and improves corrosion resistance, contributing to long-term reliability in various applications.

Maximum Drain Current (ID): 0.03 A

This reinforced drainage current specification further emphasizes the efficient low-power application suitability of this FET.

Technical Specifications

Power Field Effect Transistors (FET) BF1105WR,135 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Trade Compliance

BF1105WR,135 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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