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BF1100R,235

NXP Semiconductors

BF1100R,235 by NXP Semiconductors

BF1100R,235 from NXP Semiconductors is a single N-channel MOSFET designed for efficient power management. It supports a max drain current of 30mA and operates up to 150 °C, making it ideal for compact electronic applications. Its surface mount design ensures easy integration into various circuits.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,136 parts In-Stock

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4,136

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Anansix

USA . 2,522 parts In-Stock

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2,522

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Digiode

USA . 2,085 parts In-Stock

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2,085

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Distributors (Availability)

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AZTECH Wire

Italy . 489 parts In-Stock

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$18.450

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489

$18.450

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One Stop Electronics

USA . 1,506 parts In-Stock

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$53.050

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1,506

$53.050

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UNI Independent Distributors

Spain . 6,133 parts In-Stock

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Corphita

USA . 4,421 parts In-Stock

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Northwest PG Solutions

USA . 1,508 parts In-Stock

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1,508

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Native Components

USA . 300 parts In-Stock

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300

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Microchip USA

USA . 120 parts In-Stock

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120

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Overview

Unlock the power of innovation with the BF1100R,235 from NXP Semiconductors. Designed for efficiency and performance, this N-channel Power FET offers unbeatable reliability in demanding applications, from automotive to industrial systems. With NXP’s commitment to quality, you benefit from superior thermal management and robust operation up to 150 °C. Elevate your projects with a product that ensures longevity and peak performance — where excellence meets value!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their high electron mobility, providing better performance in switching applications and making this product suitable for high-speed circuits.

Configuration: SINGLE

Single configuration ensures simplicity in design and integration, allowing for easy incorporation into various electronic circuits.

Surface Mount: YES

Surface-mount technology (SMT) enables compact designs and simplifies automated assembly processes, enhancing the overall efficiency of manufacturing.

Maximum Drain Current (Abs) (ID): 0.03 A

With a maximum drain current of 30mA, this FET is ideal for low-power applications, offering reliability without consuming excessive energy.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology provides advantages like lower on-resistance and better thermal stability, making this FET a robust choice for various applications.

Maximum Operating Temperature: 150 °C

Operating at temperatures up to 150 °C ensures the FET can withstand harsh environments, making it suitable for automotive and industrial applications.

Terminal Finish: Matte Tin (Sn)

Matte tin finish offers improved solderability and resistance to corrosion, enhancing the longevity and reliability of the FET in circuit applications.

Technical Specifications

Power Field Effect Transistors (FET) BF1100R,235 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.03 A

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn)

Trade Compliance

BF1100R,235 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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