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BF1107,215

NXP Semiconductors

BF1107,215 by NXP Semiconductors

BF1107,215 by NXP Semiconductors is an N-channel MOSFET designed for efficient power management. It supports a max drain current of 0.01 A and operates up to 150 °C, making it ideal for high-temperature applications. Its single configuration ensures reliable performance in various electronic circuits.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 8,279 parts In-Stock

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Digiode

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Anansix

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One Stop Electronics

USA . 853 parts In-Stock

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$4.050

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853

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AZTECH Wire

Italy . 245 parts In-Stock

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Perfect Parts

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Northwest PG Solutions

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UNI Independent Distributors

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Corphita

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Native Components

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Microchip USA

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Overview

Unlock exceptional performance and reliability with the BF1107,215 from NXP Semiconductors. Crafted with precision, this N-channel power FET ensures superior efficiency in various applications, from automotive to industrial systems. With NXP's trusted reputation for quality, you can count on robust thermal management and seamless integration into your designs. Elevate your projects while enjoying lasting value and enhanced functionality—choose BF1107,215 for a smarter solution!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-state resistance and higher efficiency, making this product ideal for applications requiring high performance.

Configuration: SINGLE

The single configuration simplifies circuit design and reduces space requirements, making it suitable for compact electronic designs.

Maximum Drain Current (Abs) (ID): 0.01 A

A maximum drain current of 10 mA allows for use in low-power applications, enabling efficient operation without excessive power consumption.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and fast switching capabilities, making this FET suitable for high-speed switching applications.

Maximum Operating Temperature: 150 °C

A high operating temperature rating ensures reliability in demanding environments and protects against thermal-related failures.

Terminal Finish: TIN

Tin plating offers excellent solderability and corrosion resistance, resulting in durable and reliable connections in electronic assemblies.

Maximum Time At Peak Reflow Temperature (s): 30

The 30-second maximum time at peak reflow temperature allows for compatibility with standard soldering processes, ensuring ease of assembly.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C accommodates high-temperature soldering techniques, which increases the thermal resistance of the device during assembly.

Technical Specifications

Power Field Effect Transistors (FET) BF1107,215 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

.01 A

Maximum Drain Current (ID):

.01 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Terminal Finish:

TIN

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

BF1107,215 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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