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BF1100R-TAPE-7

NXP Semiconductors

BF1100R-TAPE-7 by NXP Semiconductors

BF1100R-TAPE-7 by NXP Semiconductors is an N-channel RF FET designed for amplifier applications. It features a max DS breakdown voltage of 14V, operates in the ultra-high frequency band, and supports dual gate enhancement mode. This compact surface mount device ensures efficient performance up to 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 2,691 parts In-Stock

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Anansix

USA . 1,254 parts In-Stock

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Digiode

USA . 974 parts In-Stock

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One Stop Electronics

USA . 474 parts In-Stock

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$65.050

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UNI Independent Distributors

Spain . 2,028 parts In-Stock

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Northwest PG Solutions

USA . 2,003 parts In-Stock

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Corphita

USA . 1,489 parts In-Stock

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Native Components

USA . 126 parts In-Stock

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Overview

Elevate your designs with the BF1100R-TAPE-7 from NXP Semiconductors—a trusted leader in innovative solutions. This high-performance RF Small Signal FET is engineered for superior efficiency and reliability, making it ideal for amplifying signals in ultra-high frequency applications. Experience enhanced performance, compact design, and unmatched durability, ensuring your projects thrive in any environment. Choose NXP for quality that empowers your success!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package provides durability and thermal stability, making the FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel configuration offers better electron mobility, resulting in higher performance and efficiency in amplification applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances protection against reverse voltage spikes, improving reliability in circuit applications.

Transistor Application: AMPLIFIER

Designed for amplification, this FET is ideal for RF applications, ensuring improved signal gain and fidelity.

Surface Mount: YES

Surface mount technology allows for compact circuit designs and easier integration into automated assembly processes.

Minimum DS Breakdown Voltage: 14 V

A minimum breakdown voltage of 14V provides robustness against over-voltage conditions, enhancing circuit reliability.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space on printed circuit boards, contributing to compact designs.

Terminal Form: GULL WING

Gull wing terminals offer a reliable connection to the PCB and are suited for automated assembly techniques.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

The dual gate design allows for enhanced control over the output, making it versatile for various RF amplification tasks.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Designed for ultra high frequency applications, making this FET suitable for advanced communication technologies.

No. of Terminals: 4

The 4-terminal configuration simplifies circuit layout while providing all necessary connections for optimal operation.

Package Style (Meter): SMALL OUTLINE

The small outline package style ensures a low profile for space-constrained applications, promoting compact circuit boards.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizing MOS technology ensures high input impedance and low power consumption, ideal for battery-operated devices.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature of 150 °C allows for reliable performance in demanding thermal environments.

Transistor Element Material: SILICON

Silicon exhibits excellent electrical properties, making it a standard choice for stable performance in electronic applications.

Maximum Drain Current (ID): 0.03 A

With a maximum drain current of 0.03 A, this FET is effective for low-power applications, ensuring efficient energy usage.

Terminal Position: DUAL

The dual terminal position streamlines circuitry and enhances the versatility of integration into various designs.

Case Connection: SOURCE

A direct source connection simplifies interfacing in various RF designs, ensuring easier integration and assembly.

Maximum Feedback Capacitance (Crss): 0.035 pF

A low feedback capacitance allows for high-frequency performance and minimizes signal distortion in amplification applications.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF1100R-TAPE-7 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Additional Features:

LOW NOISE

Case Connection:

SOURCE

Minimum DS Breakdown Voltage:

14 V

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

.035 pF

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BF1100R-TAPE-7 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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