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BF1100-TAPE-13

NXP Semiconductors

BF1100-TAPE-13 by NXP Semiconductors

BF1100-TAPE-13 by NXP Semiconductors is an N-channel RF FET designed for amplifier applications. It features a max DS breakdown voltage of 14V, operates in the ultra-high frequency band, and supports dual gate enhancement mode. This compact surface mount device excels in high-temp environments up to 150 °C.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 4,345 parts In-Stock

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Anansix

USA . 1,070 parts In-Stock

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Digiode

USA . 1,004 parts In-Stock

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One Stop Electronics

USA . 752 parts In-Stock

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$3.050

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752

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Corphita

USA . 1,387 parts In-Stock

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UNI Independent Distributors

Spain . 949 parts In-Stock

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Native Components

USA . 386 parts In-Stock

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Northwest PG Solutions

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Overview

Elevate your projects with the BF1100-TAPE-13 from NXP Semiconductors, a leader in cutting-edge technology. This high-performance RF FET delivers exceptional signal amplification in compact designs, perfect for ultra-high frequency applications. With its robust build and innovative dual-gate enhancement mode, you'll experience reliable operation and unmatched efficiency. Trust NXP's commitment to quality and innovation—transform your vision into reality today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy packaging ensures lightweight construction and durability, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher efficiency and faster switching speeds, which enhances performance in amplifier applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides additional protection and simplifies circuit design, making it easier to manage load conditions.

Transistor Application: AMPLIFIER

Designed for amplification purposes, this FET is an excellent choice for improving signal strength in RF applications.

Surface Mount: YES

Surface mount technology allows for compact device layouts and is ideal for high-density applications, enhancing design flexibility.

Minimum DS Breakdown Voltage: 14 V

A minimum breakdown voltage of 14 V makes this product suitable for a range of applications with moderate voltage requirements.

Package Shape: RECTANGULAR

The rectangular shape aids in efficient space utilization on PCBs, optimizing layout and design.

Terminal Form: GULL WING

Gull wing terminals provide excellent mechanical stability and ease of soldering, which simplifies assembly processes.

Operating Mode: DUAL GATE, ENHANCEMENT MODE

Dual gate and enhancement mode operation offers higher gain and improved linearity, making it ideal for RF amplification.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Operating in the ultra-high frequency band makes this FET suitable for advanced communication systems and RF applications.

No. of Terminals: 4

With four terminals, this FET provides versatility in circuit configurations, ensuring compatibility with various designs.

Package Style (Meter): SMALL OUTLINE

The small outline package style allows for space-saving designs, ideal for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology ensures low on-resistance and high-speed switching capabilities, enhancing overall circuit efficiency.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature allows the device to function reliably in demanding environments, increasing its longevity.

Transistor Element Material: SILICON

Silicon material offers excellent thermal and electrical characteristics, making this FET reliable for performance in various applications.

Maximum Drain Current (ID): 0.03 A

A maximum drain current of 0.03 A makes this FET suitable for low-power applications, ensuring efficient operation.

Terminal Position: DUAL

Dual terminal positions enhance design flexibility, allowing for various circuit layouts and configurations.

Case Connection: SOURCE

Direct source connection facilitates better thermal management and performance stability during operation.

Maximum Feedback Capacitance (Crss): 0.035 pF

Low feedback capacitance enhances speed response and reduces signal distortion, making this FET ideal for high-frequency applications.

Technical Specifications

RF Small Signal Field Effect Transistors (FET) BF1100-TAPE-13 attributes and parameters. Explore more RF Small Signal Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Additional Features:

LOW NOISE

Case Connection:

SOURCE

Minimum DS Breakdown Voltage:

14 V

Maximum Drain Current (ID):

.03 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

.035 pF

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

DUAL GATE, ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

BF1100-TAPE-13 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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