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MT47H128M16HG-3IT

Micron Technology

MT47H128M16HG-3IT by Micron Technology

Micron Technology's MT47H128M16HG-3IT is a DDR2 DRAM with 128MX16 organization, operating at 1.8V. It features synchronous operation, self-refresh capability, and industrial temperature grade suitability. Ideal for applications requiring high memory density and fast access times in industrial environments.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Chip Stock

USA . 20,100 parts In-Stock

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Vyrian

USA . 1,488 parts In-Stock

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1,488

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Nova Conductors

Japan . 700 parts In-Stock

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700

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Digiode

USA . 471 parts In-Stock

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471

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Distributors (Availability)

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Corohmni

South Africa . 283 parts In-Stock

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$3.048

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283

$3.048

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Andel Nordic

Denmark . 3,790 parts In-Stock

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$4.103

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$3.939

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$3.939

3,790

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$3.939

$3.939

Aztec Data Supply Inc.

USA . 16,306 parts In-Stock

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$4.532

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$4.532

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AZTECH Wire

Italy . 850 parts In-Stock

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$18.719

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850

$18.719

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Ampacity Inc.

Singapore . 698 parts In-Stock

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$22.000

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Semicontronic

India . 1,624 parts In-Stock

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$29.000

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$28.275

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$28.130

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1,624

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$28.130

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Continental Prestige Electronics

USA . 2,356 parts In-Stock

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Corphita

USA . 1,139 parts In-Stock

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Argo Parts USA

USA . 839 parts In-Stock

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839

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Aranea Global

USA . 500 parts In-Stock

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Overview

Discover the power of the Micron Technology MT47H128M16HG-3IT DDR2 DRAM. With a reputation for quality and innovation, Micron delivers cutting-edge memory solutions that excel in various applications. Whether you're looking to boost the performance of your industrial-grade equipment or enhance the efficiency of your networking devices, this product offers unmatched reliability and speed. Trust Micron Technology to provide you with the value, benefits, and advantages you need to stay ahead in today's fast-paced technological landscape.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protects the internal components of the DRAM, making it a reliable choice for long-term use.

Self Refresh: YES

The self-refresh capability helps in maintaining the data stored in the DRAM without requiring constant external refresh signals, improving efficiency and performance.

Operating Mode: SYNCHRONOUS

Synchronous operation allows for data transfer to be synchronized with a clock signal, reducing latency and improving overall speed and performance.

Nominal Supply Voltage / Vsup (V): 1.8

Operating at a low voltage of 1.8V helps in reducing power consumption, making the DRAM more energy-efficient.

Organization: 128MX16

The organization of 128MX16 indicates a high memory capacity of 128 megabytes with a 16-bit memory width, suitable for handling large amounts of data efficiently.

Technology: CMOS

Complementary Metal-Oxide-Semiconductor (CMOS) technology offers low power consumption, high speed, and reliability, making it a preferred choice for DRAM chips.

Memory Density: 2147483648 bit

With a high memory density of 2147483648 bits, this DRAM chip can store a large amount of data in a compact form factor, ideal for applications requiring high memory capacity.

Technical Specifications

DRAM MT47H128M16HG-3IT attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

MULTI BANK PAGE BURST

Maximum Access Time:

.45 ns

Additional Features:

AUTO/SELF REFRESH

JESD-30 Code:

R-PBGA-B84

Length:

14 mm

Memory Density:

2147483648 bit

Memory IC Type:

Memory Width:

16

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

84

No. of Words:

134217728 words

No. of Words Code:

128M

Operating Mode:

SYNCHRONOUS

Maximum Operating Temperature:

85 Cel

Minimum Operating Temperature:

-40 Cel

Organization:

128MX16

Package Body Material:

PLASTIC/EPOXY

Package Code:

Package Shape:

Package Style (Meter):

GRID ARRAY, THIN PROFILE, FINE PITCH

Maximum Seated Height:

1.2 mm

Self Refresh:

YES

Maximum Supply Voltage (Vsup):

1.9 V

Minimum Supply Voltage (Vsup):

1.7 V

Nominal Supply Voltage / Vsup (V):

1.8

Surface Mount:

YES

Technology:

CMOS

Temperature Grade:

Terminal Form:

BALL

Terminal Pitch:

.8 mm

Terminal Position:

BOTTOM

Width:

11.5 mm

Trade Compliance

MT47H128M16HG-3IT Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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