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MT53E2G32D4NQ-046WT:A

Micron Technology

MT53E2G32D4NQ-046WT:A by Micron Technology

Micron Technology's MT53E2G32D4NQ-046WT:A is a LPDDR4 DRAM with 2GX32 organization, 32-bit memory width, and 68719476736-bit memory density. It operates synchronously at temperatures ranging from -25°C to 85°C. Ideal for applications requiring high-speed and low-power memory solutions in compact form factors.

Median Price

$74.097

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Nova Conductors

Japan . 15 parts In-Stock

1+ parts

$74.097

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15

$74.097

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Vyrian

USA . 4,949 parts In-Stock

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Digiode

USA . 666 parts In-Stock

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666

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

AZTECH Wire

Italy . 448 parts In-Stock

1+ parts

$6.057

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448

$6.057

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Ampacity Inc.

Singapore . 786 parts In-Stock

1+ parts

$9.000

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786

$9.000

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Continental Prestige Electronics

USA . 1,791 parts In-Stock

1+ parts

$74.097

100+ parts

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$72.615

1,791

$74.097

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$72.615

Netroflash

USA . 50 parts In-Stock

1+ parts

$74.097

100+ parts

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1k+ parts

$70.392

10k+ parts

$68.910

50

$74.097

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$70.392

$68.910

Infinite Electronics LLP (Excess)

. 10,000 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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3,000

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Argo Parts USA

USA . 1,517 parts In-Stock

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1,517

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Corphita

USA . 558 parts In-Stock

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558

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Microchip USA

USA . 290 parts In-Stock

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290

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Overview

Elevate your device's performance with the MT53E2G32D4NQ-046WT:A by Micron Technology. As a leader in the industry, Micron guarantees top-notch quality and reliability. This LPDDR4 DRAM offers seamless operation in synchronous mode, ensuring smooth and efficient data processing. Whether you're a gamer, designer, or multitasker, this memory module is designed to enhance your experience with lightning-fast speeds and optimal performance. Upgrade your device today and unlock a world of possibilities with Micron's cutting-edge technology.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic and epoxy materials provide durability and protection for the internal components of the DRAM, ensuring a longer lifespan for the product.

Surface Mount: YES

Surface mount technology allows for easy and secure installation onto circuit boards, making the product suitable for mass production and integration in various electronic devices.

Package Shape: RECTANGULAR

Rectangular package shape enables efficient and space-saving placement of the DRAM on the circuit board, maximizing board real estate for other components.

Operating Mode: SYNCHRONOUS

Synchronous operation ensures precise coordination of data transfer within the DRAM, resulting in improved performance and reliability in data-intensive applications.

Maximum Operating Temperature: 85 °C

With a high maximum operating temperature, this DRAM can withstand elevated temperatures without compromising performance, making it suitable for industrial and harsh environments.

Organization: 2GX32

The 2GX32 organization provides a high memory capacity and data width, allowing for efficient data processing and storage in high-performance computing systems.

Minimum Operating Temperature: -25 °C

The low minimum operating temperature ensures reliable operation even in colder climates or environments, expanding the range of applications where this DRAM can be used.

Terminal Position: BOTTOM

Bottom terminal position simplifies the installation and connection of the DRAM to the circuit board, facilitating assembly and reducing the overall footprint of the device.

Technology: CMOS

CMOS technology offers low power consumption, high-speed operation, and compatibility with various electronic systems, making this DRAM energy-efficient and versatile for different applications.

Terminal Form: BALL

Ball terminal form provides secure and reliable connections with the circuit board, ensuring consistent performance and reducing the risk of signal loss or interference.

No. of Words: 2147483648 words

The large number of words indicates a high memory capacity, enabling the storage and processing of extensive data sets in advanced computing systems and applications.

Memory Width: 32

A memory width of 32 bits allows for efficient data transfer and processing, enhancing the overall performance and speed of the DRAM in handling complex tasks.

No. of Words Code: 2G

The 2G code signifies a significant memory capacity of the DRAM, making it suitable for demanding applications that require large storage and processing capabilities.

Memory Density: 68719476736 bit

The high memory density enables the DRAM to store a large amount of data in a compact form factor, providing a cost-effective solution for memory-intensive applications.

Memory IC Type: LPDDR4 DRAM

The LPDDR4 DRAM technology offers improved data transfer rates, lower power consumption, and higher bandwidth compared to previous generations, making it a powerful and efficient memory solution for modern devices.

Technical Specifications

DRAM MT53E2G32D4NQ-046WT:A attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

JESD-30 Code:

R-PBGA-B

Memory Density:

68719476736 bit

Memory IC Type:

Memory Width:

32

No. of Functions:

1

No. of Ports:

1

No. of Words:

2147483648 words

No. of Words Code:

2G

Operating Mode:

SYNCHRONOUS

Maximum Operating Temperature:

85 Cel

Minimum Operating Temperature:

-25 Cel

Organization:

2GX32

Package Body Material:

PLASTIC/EPOXY

Package Shape:

Self Refresh:

NO

Surface Mount:

YES

Technology:

CMOS

Terminal Form:

BALL

Terminal Position:

BOTTOM

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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