Loading...

MT53D512M32D2DS-053AUT:D

Micron Technology

MT53D512M32D2DS-053AUT:D by Micron Technology

Micron Technology's MT53D512M32D2DS-053AUT:D is a 512MX32 LPDDR4 DRAM with 1.1V, -40 to 125 °C temp range, and 1866 MHz clock freq. Ideal for automotive applications due to its robust design and high memory density of 17.18 Gb.

Median Price

$25.400

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

MT53D512M32D2DS-053AUT:D by Micron Technology
Compare Share

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Nova Conductors

Japan . 500 parts In-Stock

1+ parts

$25.400

100+ parts

-

1k+ parts

-

10k+ parts

-

500

$25.400

-

-

-

Vyrian

USA . 4,963 parts In-Stock

1+ parts

-

100+ parts

-

1k+ parts

-

10k+ parts

-

4,963

-

-

-

-

Digiode

USA . 500 parts In-Stock

1+ parts

-

100+ parts

-

1k+ parts

-

10k+ parts

-

500

-

-

-

-

Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Corohmni

South Africa . 34 parts In-Stock

1+ parts

$2.330

100+ parts

-

1k+ parts

-

10k+ parts

-

34

$2.330

-

-

-

Aztec Data Supply Inc.

USA . 2,741 parts In-Stock

1+ parts

$4.740

100+ parts

-

1k+ parts

-

10k+ parts

-

2,741

$4.740

-

-

-

Ampacity Inc.

Singapore . 520 parts In-Stock

1+ parts

$11.000

100+ parts

-

1k+ parts

-

10k+ parts

-

520

$11.000

-

-

-

Semicontronic

India . 758 parts In-Stock

1+ parts

$12.000

100+ parts

$11.700

1k+ parts

$11.640

10k+ parts

-

758

$12.000

$11.700

$11.640

-

AZTECH Wire

Italy . 814 parts In-Stock

1+ parts

$12.625

100+ parts

-

1k+ parts

-

10k+ parts

-

814

$12.625

-

-

-

Continental Prestige Electronics

USA . 4,616 parts In-Stock

1+ parts

$25.400

100+ parts

-

1k+ parts

-

10k+ parts

$24.892

4,616

$25.400

-

-

$24.892

Netroflash

USA . 2,000 parts In-Stock

1+ parts

$25.400

100+ parts

-

1k+ parts

-

10k+ parts

-

2,000

$25.400

-

-

-

Futuretech Components

Singapore . 8,510 parts In-Stock

1+ parts

-

100+ parts

-

1k+ parts

-

10k+ parts

-

8,510

-

-

-

-

Authorized Procurement Solutions

USA . 2,000 parts In-Stock

1+ parts

-

100+ parts

-

1k+ parts

-

10k+ parts

-

2,000

-

-

-

-

Argo Parts USA

USA . 1,585 parts In-Stock

1+ parts

-

100+ parts

-

1k+ parts

-

10k+ parts

-

1,585

-

-

-

-

Corphita

USA . 741 parts In-Stock

1+ parts

-

100+ parts

-

1k+ parts

-

10k+ parts

-

741

-

-

-

-

Overview

Experience unparalleled performance and reliability with the MT53D512M32D2DS-053AUT:D by Micron Technology. As a leader in the industry, Micron Technology is known for producing high-quality DRAM products that exceed expectations. Ideal for automotive applications, this LPDDR4 DRAM offers a nominal supply voltage of 1.1V and a maximum clock frequency of 1866 MHz. With a wide operating temperature range from -40°C to 125°C, this memory module ensures optimal performance even in harsh conditions. Trust Micron Technology to deliver cutting-edge solutions that provide value, efficiency, and innovation to meet your technological needs.

Feature Benefit Bullets

Nominal Supply Voltage / Vsup (V): 1.1

Low voltage requirement helps in energy efficiency and prolongs battery life for devices using this DRAM.

Maximum Operating Temperature: 125 °C

Can operate at high temperatures, making it suitable for use in automotive applications where temperature fluctuations can occur.

Organization: 512MX32

High organizational structure allows for efficient data handling and processing capabilities.

Minimum Operating Temperature: -40 °C

Capable of functioning in extremely low temperatures, making it suitable for rugged environments.

Maximum Clock Frequency (fCLK): 1866 MHz

High clock frequency enables fast data transfer speeds, improving overall system performance.

Temperature Grade: AUTOMOTIVE

Specifically designed for automotive applications, ensuring reliable performance under harsh conditions.

Technology: CMOS

CMOS technology offers low power consumption and high speed operation, making it an ideal choice for energy-efficient devices.

Memory Density: 17179869184 bit

High memory density provides ample storage capacity for data-intensive applications.

Memory IC Type: LPDDR4 DRAM

LPDDR4 DRAM technology offers increased data transfer speeds and power efficiency compared to previous generations, making it a high-performance option for memory-intensive tasks.

Technical Specifications

DRAM MT53D512M32D2DS-053AUT:D attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Maximum Clock Frequency (fCLK):

1866 MHz

Memory Density:

17179869184 bit

Memory IC Type:

Memory Width:

32

No. of Functions:

1

No. of Ports:

1

No. of Words:

536870912 words

No. of Words Code:

512M

Maximum Operating Temperature:

125 Cel

Minimum Operating Temperature:

-40 Cel

Organization:

512MX32

Nominal Supply Voltage / Vsup (V):

1.1

Technology:

CMOS

Temperature Grade:

Trade Compliance

MT53D512M32D2DS-053AUT:D Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

previous next
The material and information contained is this video is for educational and general information purposes. All rights remain with respective rightsholders. Fair Use Statement

Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

Category top products 20

Authentic purchasing experiences

Partstack™ will investigate all reported instances of potential suspect/counterfeit part listings.

Similar products 19