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EDB4432BBBJ-1DAIT-F-D

Micron Technology

EDB4432BBBJ-1DAIT-F-D by Micron Technology

Micron Technology's EDB4432BBBJ-1DAIT-F-D is a 128MX32 LPDDR2 DRAM with 134 terminals, operating at 1.2V. It features synchronous operation, self-refresh capability, and single bank page burst access mode. Ideal for industrial applications requiring high memory density and low power consumption.

Median Price

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Lifecycle Status

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6

In-Stock Inventory

1k+

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Avnet

USA . 1,343 parts In-Stock

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Chip Stock

USA . 14,700 parts In-Stock

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Vyrian

USA . 5,185 parts In-Stock

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Digiode

USA . 1,314 parts In-Stock

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Nova Conductors

Japan . 150 parts In-Stock

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Resion

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Aztec Data Supply Inc.

USA . 4,052 parts In-Stock

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$4.240

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$4.240

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Corohmni

South Africa . 855 parts In-Stock

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$5.865

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Ampacity Inc.

Singapore . 344 parts In-Stock

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$7.000

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AZTECH Wire

Italy . 533 parts In-Stock

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$14.135

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Semicontronic

India . 1,179 parts In-Stock

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$17.000

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$16.575

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$16.490

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QUARKTWIN TECHNOLOGY LTD

USA . 22,126 parts In-Stock

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Perfect Parts

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Continental Prestige Electronics

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Argo Parts USA

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Kepictronics

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Corphita

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Microchip USA

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Bastille Electronics

Australia . 200 parts In-Stock

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Overview

Experience unparalleled speed and efficiency with the Micron Technology EDB4432BBBJ-1DAIT-F-D DRAM module. Crafted by a trusted manufacturer, this cutting-edge product offers seamless performance in a wide range of applications. With its superior quality and advanced features like self-refresh and synchronous operation, this memory module ensures optimal reliability and responsiveness. Elevate your systems to new heights with the value and benefits that only Micron Technology can provide. Upgrade to Micron DRAM for a smoother, more efficient computing experience.

Feature Benefit Bullets

Package Body Material

PLASTIC/EPOXY - This material is durable and provides good protection for the components inside, making it a reliable choice.

Surface Mount

YES - Being surface mountable makes it easy to integrate this DRAM into various electronic devices for efficient use of space.

Package Shape

RECTANGULAR - The rectangular shape allows for easy stacking and integration into circuit boards, optimizing space usage.

Operating Mode

SYNCHRONOUS - Synchronous operation ensures precise timing and coordination with other components, enhancing overall system performance.

Self Refresh

YES - The self-refresh feature helps in saving power and improving battery life in devices where this DRAM is used.

Nominal Supply Voltage / Vsup (V)

1.2 - The low nominal supply voltage helps in reducing power consumption and heat generation, ideal for energy-efficient devices.

No. of Terminals

134 - With a high number of terminals, this DRAM offers flexibility in connecting to other components for seamless operation.

Package Style (Meter)

GRID ARRAY, VERY THIN PROFILE, FINE PITCH - This package style allows for high-density mounting, making it suitable for compact electronic devices.

Maximum Operating Temperature

85 °C - The high maximum operating temperature tolerance ensures reliability even in harsh environmental conditions.

Organization

128MX32 - This organization provides a high memory capacity and data width, suitable for demanding applications that require fast data processing.

Minimum Operating Temperature

40 °C - The low minimum operating temperature range allows for usage in cold environments without compromising performance.

Terminal Position

BOTTOM - The bottom terminal position simplifies the PCB layout and makes it easier to connect to other components in the system.

Maximum Seated Height

0.75 mm - The low seated height profile makes it suitable for slim devices while maintaining high memory capacity.

Width

10 mm - The compact width of this DRAM allows for easy integration into tight spaces in electronic devices.

Minimum Supply Voltage (Vsup)

1.14 V - The low minimum supply voltage requirement helps in reducing power consumption and heat dissipation, enhancing energy efficiency.

Length

11.5 mm - The moderate length of this DRAM makes it versatile for use in various electronic devices without compromising performance.

Temperature Grade

INDUSTRIAL - The industrial-grade temperature tolerance ensures reliable operation even in extreme temperature variations.

Access Mode

SINGLE BANK PAGE BURST - The single bank access mode with page burst feature enhances data access speed, ideal for high-performance applications.

Technology

CMOS - The CMOS technology used in this DRAM offers low power consumption and high speed, making it suitable for energy-efficient devices.

Terminal Form

BALL - The ball terminal form factor simplifies the soldering process and provides a secure connection for stable performance.

No. of Words

134217728 words - With a high number of words, this DRAM offers extensive memory storage capacity for storing large datasets and running multiple applications simultaneously.

Memory Width

32 - The wide memory width enhances data transfer speed and efficiency, essential for applications that require fast processing.

Terminal Pitch

0.65 mm - The small terminal pitch allows for high-density mounting on PCBs, making it suitable for compact electronic devices.

No. of Words Code

128M - The coding of 128M for the number of words simplifies identifying and integrating this DRAM into systems without confusion.

Maximum Supply Voltage (Vsup)

1.3 V - The maximum supply voltage tolerance provides a safe operating range while ensuring stable performance under fluctuating voltage conditions.

Memory Density

4294967296 bit - The high memory density offers ample storage capacity for data-intensive applications, enabling smooth operation without storage limitations.

Memory IC Type

LPDDR2 DRAM - The LPDDR2 DRAM type delivers high performance with low power consumption, making it suitable for mobile and embedded applications.

Technical Specifications

DRAM EDB4432BBBJ-1DAIT-F-D attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

SINGLE BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH; IT ALSO REQUIRES 1.8V NOMINAL SUPPLY

JESD-30 Code:

R-PBGA-B134

Length:

11.5 mm

Memory Density:

4294967296 bit

Memory IC Type:

Memory Width:

32

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

134

No. of Words:

134217728 words

No. of Words Code:

128M

Operating Mode:

SYNCHRONOUS

Maximum Operating Temperature:

85 Cel

Minimum Operating Temperature:

-40 Cel

Organization:

128MX32

Package Body Material:

PLASTIC/EPOXY

Package Code:

Package Shape:

Package Style (Meter):

GRID ARRAY, VERY THIN PROFILE, FINE PITCH

Peak Reflow Temperature (C):

NOT SPECIFIED

Maximum Seated Height:

.75 mm

Self Refresh:

YES

Maximum Supply Voltage (Vsup):

1.3 V

Minimum Supply Voltage (Vsup):

1.14 V

Nominal Supply Voltage / Vsup (V):

1.2

Surface Mount:

YES

Technology:

CMOS

Temperature Grade:

Terminal Form:

BALL

Terminal Pitch:

.65 mm

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Width:

10 mm

Trade Compliance

EDB4432BBBJ-1DAIT-F-D Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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