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EDB4432BBBJ-1DAIT-F

Micron Technology

EDB4432BBBJ-1DAIT-F by Micron Technology

Micron Technology's EDB4432BBBJ-1DAIT-F is a PLASTIC/EPOXY DRAM with 128MX32 organization and 32-bit memory width. It operates synchronously, has self-refresh capability, and is suitable for industrial applications.

Median Price

-

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Chip Stock

USA . 18,300 parts In-Stock

1+ parts

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18,300

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Vyrian

USA . 1,388 parts In-Stock

1+ parts

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1k+ parts

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1,388

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Digiode

USA . 708 parts In-Stock

1+ parts

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708

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Nova Conductors

Japan . 47 parts In-Stock

1+ parts

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47

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Ampacity Inc.

Singapore . 1,613 parts In-Stock

1+ parts

$14.000

100+ parts

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1k+ parts

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10k+ parts

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1,613

$14.000

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AZTECH Wire

Italy . 770 parts In-Stock

1+ parts

$15.516

100+ parts

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770

$15.516

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Argo Parts USA

USA . 1,464 parts In-Stock

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1,464

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Corphita

USA . 1,160 parts In-Stock

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1,160

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Continental Prestige Electronics

USA . 409 parts In-Stock

1+ parts

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409

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Bastille Electronics

Australia . 35 parts In-Stock

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35

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Overview

Discover the power of cutting-edge technology with the EDB4432BBBJ-1DAIT-F by Micron Technology. As a leading manufacturer in the industry, Micron guarantees top-notch quality and reliability. This DRAM module offers incredible value and benefits for a variety of applications. Whether you're a gaming enthusiast, professional designer, or working in data-intensive fields, this product delivers superior performance and efficiency. Experience lightning-fast speeds and seamless multitasking without compromising on stability. Upgrade your device today and unlock a world of possibilities with Micron Technology.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material of the package body provides durability and protection to the DRAM, making it a reliable choice for various applications.

Surface Mount: YES

The surface mount capability allows for easy installation and integration with other electronic components, making it convenient for circuit board assembly.

No. of Functions: 1

With a single function, this DRAM simplifies system design and implementation, making it suitable for straightforward applications.

Package Shape: RECTANGULAR

The rectangular package shape offers compatibility with standard mounting and packaging techniques, ensuring easy integration into various systems.

Operating Mode: SYNCHRONOUS

The synchronous operation enables the DRAM to synchronize with the system clock, resulting in efficient and reliable data processing.

Self Refresh: YES

The self-refresh feature allows the DRAM to maintain data integrity while consuming minimal power, making it energy-efficient and suitable for battery-operated devices.

Nominal Supply Voltage / Vsup (V): 1.2

The low nominal supply voltage of 1.2V enhances power efficiency and reduces heat generation, contributing to overall system performance and longevity.

No. of Terminals: 134

With 134 terminals, this DRAM provides a sufficient number of connections for seamless data transfer and communication between the memory module and the system.

Package Style (Meter): GRID ARRAY, VERY THIN PROFILE, FINE PITCH

The grid array package style with a very thin profile and fine pitch ensures a compact and space-saving design, suitable for applications with limited space constraints.

Maximum Operating Temperature: 85 °C

The high maximum operating temperature tolerance of 85°C indicates the DRAM's ability to withstand elevated temperature environments, ensuring long-term reliability and stability.

Organization: 128MX32

The organization of 128MX32 allows for a high memory capacity and efficient data storage, making it suitable for memory-intensive tasks and applications.

Minimum Operating Temperature: -40 °C

The low minimum operating temperature tolerance of -40°C signifies the DRAM's capability to function in extremely cold environments, making it suitable for harsh operating conditions.

Terminal Position: BOTTOM

The bottom terminal position simplifies PCB layout and facilitates easy connection with other components, enabling efficient system integration.

No. of Ports: 1

With a single port, this DRAM provides straightforward data access and management, making it suitable for applications that require sequential operations.

Maximum Seated Height: 0.75 mm

The low maximum seated height of just 0.75mm ensures compatibility with slim and compact devices, facilitating space-efficient system designs.

Width: 10 mm

The width of 10mm contributes to the DRAM's compact form factor, enabling it to be easily incorporated into systems with space limitations.

Minimum Supply Voltage (Vsup): 1.14 V

The low minimum supply voltage requirement of 1.14V enhances power efficiency and supports reliable operation, contributing to improved system performance.

Length: 11.5 mm

The length of 11.5mm ensures a compact footprint, making the DRAM suitable for space-constrained applications and systems.

Temperature Grade: INDUSTRIAL

The industrial temperature grade ensures that the DRAM can operate reliably in harsh environments with demanding temperature conditions, making it suitable for industrial applications.

Access Mode: SINGLE BANK PAGE BURST

The single bank page burst access mode optimizes data access and transfer, enhancing memory performance and overall system responsiveness.

Technology: CMOS

The CMOS technology employed in this DRAM offers low power consumption, high noise immunity, and compatibility with a wide range of systems, making it a versatile and energy-efficient choice.

Terminal Form: BALL

The ball terminal form simplifies the assembly and soldering process, ensuring reliable connections and facilitating efficient production.

No. of Words: 134217728 words

With a high number of words, this DRAM provides ample storage capacity, making it suitable for data-intensive applications and multitasking scenarios.

Memory Width: 32

The memory width of 32 bits allows for efficient data transfer and processing, contributing to overall system speed and performance.

Terminal Pitch: 0.65 mm

The small terminal pitch of 0.65mm facilitates precise connections and compact designs, making it suitable for applications with limited board space.

No. of Words Code: 128M

The 128M words code indicates a large memory capacity, ensuring ample storage for demanding applications and data-intensive tasks.

Maximum Supply Voltage (Vsup): 1.3 V

The maximum supply voltage tolerance of 1.3V ensures compatibility with typical power supply systems, providing stable and reliable operation.

Memory Density: 4294967296 bit

With a high memory density of 4294967296 bits, this DRAM offers extensive data storage capabilities, suitable for applications that require vast amounts of memory.

Memory IC Type: LPDDR2 DRAM

The LPDDR2 DRAM type provides low power consumption, high bandwidth, and excellent performance, making it an ideal choice for mobile devices and other power-constrained applications.

Technical Specifications

DRAM EDB4432BBBJ-1DAIT-F attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

SINGLE BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH; IT ALSO REQUIRES 1.8V NOMINAL SUPPLY

JESD-30 Code:

R-PBGA-B134

Length:

11.5 mm

Memory Density:

4294967296 bit

Memory IC Type:

Memory Width:

32

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

134

No. of Words:

134217728 words

No. of Words Code:

128M

Operating Mode:

SYNCHRONOUS

Maximum Operating Temperature:

85 Cel

Minimum Operating Temperature:

-40 Cel

Organization:

128MX32

Package Body Material:

PLASTIC/EPOXY

Package Code:

Package Shape:

Package Style (Meter):

GRID ARRAY, VERY THIN PROFILE, FINE PITCH

Peak Reflow Temperature (C):

NOT SPECIFIED

Maximum Seated Height:

.75 mm

Self Refresh:

YES

Maximum Supply Voltage (Vsup):

1.3 V

Minimum Supply Voltage (Vsup):

1.14 V

Nominal Supply Voltage / Vsup (V):

1.2

Surface Mount:

YES

Technology:

CMOS

Temperature Grade:

Terminal Form:

BALL

Terminal Pitch:

.65 mm

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Width:

10 mm

Trade Compliance

EDB4432BBBJ-1DAIT-F Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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