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EDB4432BBBJ-1DAUT-F-D

Micron Technology

EDB4432BBBJ-1DAUT-F-D by Micron Technology

Micron Technology's EDB4432BBBJ-1DAUT-F-D is a PLASTIC/EPOXY DRAM with SYNCHRONOUS operating mode and SELF REFRESH capability. It has a memory density of 4294967296 bit and is commonly used in AUTOMOTIVE applications.

Median Price

-

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Chip Stock

USA . 22,600 parts In-Stock

1+ parts

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22,600

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Vyrian

USA . 3,643 parts In-Stock

1+ parts

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100+ parts

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1k+ parts

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10k+ parts

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3,643

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Digiode

USA . 2,414 parts In-Stock

1+ parts

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100+ parts

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2,414

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Nova Conductors

Japan . 50 parts In-Stock

1+ parts

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100+ parts

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1k+ parts

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50

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

AZTECH Wire

Italy . 880 parts In-Stock

1+ parts

$19.048

100+ parts

-

1k+ parts

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10k+ parts

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880

$19.048

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Ampacity Inc.

Singapore . 1,032 parts In-Stock

1+ parts

$22.000

100+ parts

-

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1,032

$22.000

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Corphita

USA . 2,141 parts In-Stock

1+ parts

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2,141

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Argo Parts USA

USA . 1,278 parts In-Stock

1+ parts

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1,278

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Continental Prestige Electronics

USA . 835 parts In-Stock

1+ parts

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100+ parts

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1k+ parts

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835

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Microchip USA

USA . 107 parts In-Stock

1+ parts

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100+ parts

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107

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Bastille Electronics

Australia . 50 parts In-Stock

1+ parts

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100+ parts

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1k+ parts

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50

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Overview

Discover the power of the EDB4432BBBJ-1DAUT-F-D by Micron Technology, a high-quality DRAM that combines top-notch performance with exceptional value. As a trusted manufacturer in the industry, Micron Technology brings years of expertise and innovation to this cutting-edge product. Ideal for automotive applications, this LPDDR2 DRAM offers seamless operation and a wide range of benefits. With its synchronous operating mode and self-refresh capabilities, it ensures optimal performance even in demanding conditions. The compact rectangular shape, fine pitch, and thin profile make it easy to integrate into any design. Experience true reliability and efficiency with the EDB4432BBBJ-1DAUT-F-D - the ultimate choice for your memory needs.

Feature Benefit Bullets

Package Body Material:

PLASTIC/EPOXY - This material provides durability and protection for the DRAM, making it a reliable choice for long-term use.

Surface Mount:

YES - The surface mount feature allows for easy installation and integration into various electronic devices, making it convenient and versatile.

No. of Functions:

1 - With a single function, this DRAM simplifies the design and reduces complexity, ensuring efficient performance.

Package Shape:

RECTANGULAR - The rectangular shape allows for easy placement and arrangement within electronic systems, optimizing space utilization.

Operating Mode:

SYNCHRONOUS - The synchronous operation ensures efficient communication and coordination between the DRAM and other system components, enhancing overall performance.

Self Refresh:

YES - The self-refresh capability enables power-saving mode when the DRAM is not in use, contributing to energy efficiency and extended battery life in portable devices.

Nominal Supply Voltage / Vsup (V):

1.2 - This low voltage requirement reduces power consumption and heat generation, resulting in improved energy efficiency and reliability.

No. of Terminals:

134 - The ample number of terminals allows for enhanced connectivity options, ensuring seamless integration into a wide range of electronic systems.

Package Style (Meter):

GRID ARRAY, VERY THIN PROFILE, FINE PITCH - The grid array package style with a very thin profile and fine pitch offers high-density packaging, enabling efficient use of board space and improved signal integrity.

Maximum Operating Temperature:

125 °C - With a high maximum operating temperature, this DRAM can withstand demanding environmental conditions, making it suitable for various applications.

Organization:

128MX32 - The organization of 128 Megabits by 32 bits allows for efficient data storage and retrieval, enabling high-speed and reliable performance.

Minimum Operating Temperature:

40 °C - The wide temperature range ensures reliable operation even in extreme cold conditions, making it suitable for automotive and industrial applications.

Terminal Finish:

Tin/Silver/Copper (Sn/Ag/Cu) - The tin/silver/copper terminal finish provides excellent conductivity and corrosion resistance, ensuring reliable and long-lasting connections.

Terminal Position:

BOTTOM - The terminal position at the bottom simplifies the assembly process and enables space-saving designs, enhancing overall system compactness and performance.

No. of Ports:

1 - With a single port, this DRAM is optimized for applications that require unidirectional data flow, ensuring efficient data transfer and processing.

Maximum Seated Height:

0.75 mm - The low maximum seated height allows for compact designs and helps to ensure compatibility with space-constrained applications.

Width:

10 mm - The compact width facilitates easy integration into various electronic systems, allowing for flexible placement and efficient board space utilization.

Minimum Supply Voltage (Vsup):

1.14 V - The low minimum supply voltage requirement ensures compatibility with a wide range of power sources, making it suitable for various applications.

Maximum Time At Peak Reflow Temperature (s):

30 - The maximum time at peak reflow temperature helps to ensure successful and reliable soldering during production, ensuring high-quality and robust connections.

Peak Reflow Temperature °C:

260 - The high peak reflow temperature ensures proper solder melting and bonding, resulting in strong connections that withstand thermal stress and shock.

Length:

11.5 mm - The compact length allows for easy integration into space-constrained designs, ensuring efficient use of available board space.

Temperature Grade:

AUTOMOTIVE - Designed to meet automotive industry standards, this DRAM can withstand the demanding temperature variations and environmental conditions in automotive applications.

Access Mode:

SINGLE BANK PAGE BURST - The single bank page burst access mode improves memory access efficiency and speed, enhancing overall system performance.

Technology:

CMOS - Built using Complementary Metal-Oxide-Semiconductor technology, this DRAM offers low power consumption, high speed, and excellent reliability, making it an ideal choice for various applications.

Terminal Form:

BALL - The ball terminal form allows for reliable surface mount connections, ensuring strong electrical and mechanical integrity even in harsh operating conditions.

No. of Words:

134217728 words - With a large number of words, this DRAM offers generous storage capacity, making it suitable for applications that require substantial data storage and processing capabilities.

Memory Width:

32 - The 32-bit memory width enables efficient data handling and manipulation, optimizing system performance and compatibility.

Terminal Pitch:

0.65 mm - The small terminal pitch allows for high-density packaging and efficient utilization of board space, making it suitable for compact electronic designs.

No. of Words Code:

128M - The 128M words code ensures easy identification and compatibility, facilitating the integration of this DRAM into various system architectures.

Maximum Supply Voltage (Vsup):

1.95 V - The maximum supply voltage specifies the reliable upper limit for power input, ensuring safe operation and protection against overvoltage conditions.

Memory Density:

4294967296 bit - With a high memory density, this DRAM offers substantial storage capacity, enabling advanced applications and efficient data processing.

Memory IC Type:

LPDDR2 DRAM - The LPDDR2 DRAM type combines low power consumption, high performance, and high data reliability, making it an excellent choice for battery-powered devices and memory-intensive applications.

Technical Specifications

DRAM EDB4432BBBJ-1DAUT-F-D attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

SINGLE BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH; IT ALSO REQUIRES 1.8V NOM

JESD-30 Code:

R-PBGA-B134

JESD-609 Code:

e1

Length:

11.5 mm

Memory Density:

4294967296 bit

Memory IC Type:

Memory Width:

32

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

134

No. of Words:

134217728 words

No. of Words Code:

128M

Operating Mode:

SYNCHRONOUS

Maximum Operating Temperature:

125 Cel

Minimum Operating Temperature:

-40 Cel

Organization:

128MX32

Package Body Material:

PLASTIC/EPOXY

Package Code:

Package Shape:

Package Style (Meter):

GRID ARRAY, VERY THIN PROFILE, FINE PITCH

Peak Reflow Temperature (C):

260

Maximum Seated Height:

.75 mm

Self Refresh:

YES

Maximum Supply Voltage (Vsup):

1.95 V

Minimum Supply Voltage (Vsup):

1.14 V

Nominal Supply Voltage / Vsup (V):

1.2

Surface Mount:

YES

Technology:

CMOS

Temperature Grade:

Terminal Finish:

Tin/Silver/Copper (Sn/Ag/Cu)

Terminal Form:

BALL

Terminal Pitch:

.65 mm

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

30

Width:

10 mm

Trade Compliance

EDB4432BBBJ-1DAUT-F-D Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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