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MT41K256M16HA-125XIT:E

Micron Technology

MT41K256M16HA-125XIT:E by Micron Technology

Micron Technology's MT41K256M16HA-125XIT:E is a DDR3L DRAM with 256MX16 organization, operating at 1.35V. It features synchronous mode, self-refresh capability, and multi-bank page burst access. Suitable for applications requiring high memory density and fast data processing in grid array package style.

Median Price

$70.304

Lifecycle Status

Suppliers In-Stock

7

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Freelance Electronics

USA . 1 parts In-Stock

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$70.304

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Vyrian

USA . 4,320 parts In-Stock

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Digiode

USA . 512 parts In-Stock

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512

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Nova Conductors

Japan . 73 parts In-Stock

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Velocity Electronics

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NexGen Digital

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Prism Electronics

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Distributors (Availability)

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Aztec Data Supply Inc.

USA . 2,252 parts In-Stock

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$2.420

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$2.420

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Corohmni

South Africa . 354 parts In-Stock

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$3.702

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Ampacity Inc.

Singapore . 771 parts In-Stock

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$4.000

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771

$4.000

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AZTECH Wire

Italy . 548 parts In-Stock

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$8.752

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Semicontronic

India . 721 parts In-Stock

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$12.000

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$11.700

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$11.640

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Component Stockers USA

USA . 451 parts In-Stock

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$99.990

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Continental Prestige Electronics

USA . 6,157 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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Argo Parts USA

USA . 2,238 parts In-Stock

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Corphita

USA . 1,835 parts In-Stock

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Kepictronics

USA . 1,335 parts In-Stock

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Bastille Electronics

Australia . 1,000 parts In-Stock

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Robosynatics

Brazil . 950 parts In-Stock

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Futuretech Components

Singapore . 799 parts In-Stock

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Microchip USA

USA . 224 parts In-Stock

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Pacific Micro-Tech

USA . 200 parts In-Stock

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Perfect Parts

USA . 112 parts In-Stock

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Overview

Experience unparalleled speed and reliability with Micron Technology's MT41K256M16HA-125XIT:E DDR3L DRAM. Designed for seamless integration in a variety of applications, this high-quality memory module offers exceptional performance and efficiency. With its advanced technology and innovative design, customers can enjoy faster data processing, improved multitasking capabilities, and overall enhanced user experience. Upgrade your system today with the MT41K256M16HA-125XIT:E and discover the difference Micron Technology can make in your digital world.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides good durability and protection for the DRAM, ensuring long-lasting performance.

Surface Mount: YES

Allows for easy installation and integration into electronic devices.

Operating Mode: SYNCHRONOUS

Enables synchronized data transfer and processing, improving overall system performance.

Nominal Supply Voltage / Vsup (V): 1.35

Efficient voltage supply ensures consistent and stable operation of the DRAM.

No. of Terminals: 96

Sufficient number of terminals for connectivity and data transfer between the DRAM and other components.

Technology: CMOS

CMOS technology offers low power consumption and high speed operation, making the DRAM energy-efficient and effective.

Memory IC Type: DDR3L DRAM

DDR3L technology provides high-speed data transfer and processing capabilities, ideal for demanding applications.

Technical Specifications

DRAM MT41K256M16HA-125XIT:E attributes and parameters. Explore more DRAM devices from Micron Technology

Specs

Access Mode:

MULTI BANK PAGE BURST

Additional Features:

AUTO/SELF REFRESH

JESD-30 Code:

R-PBGA-B96

JESD-609 Code:

e1

Memory Density:

4294967296 bit

Memory IC Type:

Memory Width:

16

No. of Functions:

1

No. of Ports:

1

No. of Terminals:

96

No. of Words:

268435456 words

No. of Words Code:

256M

Operating Mode:

SYNCHRONOUS

Organization:

256MX16

Package Body Material:

PLASTIC/EPOXY

Package Code:

BGA

Package Shape:

Package Style (Meter):

GRID ARRAY

Peak Reflow Temperature (C):

260

Self Refresh:

YES

Maximum Supply Voltage (Vsup):

1.45 V

Minimum Supply Voltage (Vsup):

1.283 V

Nominal Supply Voltage / Vsup (V):

1.35

Surface Mount:

YES

Technology:

CMOS

Terminal Finish:

Tin/Silver/Copper (Sn/Ag/Cu)

Terminal Form:

BALL

Terminal Position:

BOTTOM

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

MT41K256M16HA-125XIT:E Memory ICs trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8542.32.00.36

SB

8542.32.00.23

PCN

Manufacturer Highlights

Micron Technology

Micron Technology, Inc. is a leading provider of cutting-edge semiconductor solutions and products, based in Boise, Idaho. Founded in 1978, the company manufactures dynamic random-access memory (DRAM), flash memory, USB flash drives and other storage solutions used by a wide range of businesses and consumers around the world. With more than 35,000 employees worldwide and a $20 billion market capitalization as of 2019, Micron has remained at the forefront of technological innovation for over 40 years. The company's products are used in enterprise applications such as networking and data centers; mobile computing devices including smartphones and tablets; personal computers; automotive electronics; embedded systems; gaming consoles; imaging systems; industrial manufacturing processes; medical devices; military systems and more.

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Management team

President, CEO

Sanjay Mehrotra

Executive VP, CFO

Mark J. Murphy

Executive VP, CBO

Sumit Sadana

Manufacturer fab locations 23

Fab name Location Fab Initiation Wafer Capacity

Fab 4

Fabrication

Fab Initiation

1994

USA

Boise

Wafer Capacity

8,750

1994

8,750

Fab 6

Fabrication

Fab Initiation

1997

USA

Manassas

Wafer Capacity

23,000

1997

23,000

Fab 6

Fabrication

Fab Initiation

2006

USA

Manassas

Wafer Capacity

28,000

2006

28,000

Fab 11

Fabrication

Fab Initiation

2007

Taiwan

Taoyuan

Wafer Capacity

34,000

2007

34,000

Fab 16 A1

Fabrication

Fab Initiation

2007

Taiwan

Taichung

Wafer Capacity

50,000

2007

50,000

Fab 16 A3

Fabrication

Fab Initiation

2021

Taiwan

Taichung

Wafer Capacity

3,000

2021

3,000

Fab 15

Fabrication

Fab Initiation

2002

Japan

Hiroshima

Wafer Capacity

98,000

2002

98,000

Fab 11

Fabrication

Fab Initiation

2004

Taiwan

Taoyuan

Wafer Capacity

34,000

2004

34,000

New Hiroshima DRAM Fab

Fabrication

Fab Initiation

-

Japan

Hiroshima

Wafer Capacity

-

Fab 4

Fabrication

Fab Initiation

2017

USA

Boise

Wafer Capacity

11,750

2017

11,750

Fab 10W

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

20,000

2016

20,000

Fab 10X

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

55,000

2016

55,000

Fab 15

Fabrication

Fab Initiation

2019

Japan

Hiroshima

Wafer Capacity

18,000

2019

18,000

Fab 10A

Fabrication

Fab Initiation

2019

Singapore

Singapore

Wafer Capacity

18,000

2019

18,000

Fab 10N

Fabrication

Fab Initiation

2014

Singapore

Singapore

Wafer Capacity

47,000

2014

47,000

Fab 11

Fabrication

Fab Initiation

2000

Taiwan

Taoyuan

Wafer Capacity

32,000

2000

32,000

Fab 4

Fabrication

Fab Initiation

2012

USA

Boise

Wafer Capacity

6,000

2012

6,000

Fab 16 A2

Fabrication

Fab Initiation

2015

Taiwan

Taichung

Wafer Capacity

43,000

2015

43,000

New Clay Fab Phase 1

Fabrication

Fab Initiation

2027

USA

Clay

Wafer Capacity

2027

New Boise Fab 1

Fabrication

Fab Initiation

2025

USA

Boise

Wafer Capacity

2025

Fab 15

Fabrication

Fab Initiation

2021

Japan

Hiroshima

Wafer Capacity

2021

Fab 16 A5

Fabrication

Fab Initiation

2028

Taiwan

Taichung

Wafer Capacity

2028

Expansion Fab

Fabrication

Fab Initiation

2020

USA

Manassas

Wafer Capacity

6,000

2020

6,000

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