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STW8NA60

STMicroelectronics

STW8NA60 by STMicroelectronics

STW8NA60 by STMicroelectronics is an N-channel FET designed for switching applications, featuring a 600V breakdown voltage and a max drain current of 8A. It operates in enhancement mode with a power dissipation of up to 150W. Ideal for high-efficiency power management solutions.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 2,735 parts In-Stock

1+ parts

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2,735

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Vyrian

USA . 2,263 parts In-Stock

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2,263

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Anansix

USA . 1,019 parts In-Stock

1+ parts

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1,019

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,435 parts In-Stock

1+ parts

$0.947

100+ parts

-

1k+ parts

$0.852

10k+ parts

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1,435

$0.947

-

$0.852

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MKK Technologies

India . 176 parts In-Stock

1+ parts

$1.780

100+ parts

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176

$1.780

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DigiPath Technology Company

USA . 176 parts In-Stock

1+ parts

$1.780

100+ parts

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176

$1.780

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Kepictronics

USA . 3,500 parts In-Stock

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3,500

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Parana Technologies

USA . 2,015 parts In-Stock

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$1.132

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2,015

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$1.132

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Corphita

USA . 825 parts In-Stock

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825

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Assy Fe

Spain . 14 parts In-Stock

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14

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Overview

Transform your projects with the STW8NA60 from STMicroelectronics, a premium power FET designed for exceptional efficiency and reliability. With its robust 600V breakdown voltage and versatile switching capabilities, this N-channel transistor excels in demanding applications. STMicroelectronics is renowned for innovation and quality, ensuring that you receive a durable component that enhances performance, reduces energy consumption, and drives your success in any electronic design. Experience the difference today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package provides durability and protection from environmental factors, making this FET suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel type allows for better performance in switching applications due to lower on-resistance.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances circuit protection and simplifies design by eliminating the need for an external diode.

Transistor Application: SWITCHING

Designed specifically for switching applications, making it ideal for use in power regulation and control circuits.

Minimum DS Breakdown Voltage: 600 V

A high breakdown voltage makes this FET suitable for high-voltage applications, ensuring reliability under tough conditions.

Package Shape: RECTANGULAR

The rectangular shape of the package promotes efficient space utilization in circuits.

Terminal Form: THROUGH-HOLE

Through-hole mounting provides robust mechanical stability and makes it easy to solder onto printed circuit boards.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation contributes to higher input impedance and improves overall efficiency in applications.

Maximum Pulsed Drain Current (IDM): 32 A

A high pulsed drain current rating allows for dynamic performance in short burst applications, ensuring versatility in usage.

Avalanche Energy Rating (EAS): 480 mJ

This rating indicates that the FET can handle unexpected transients, providing added robustness in demanding environments.

Maximum Drain Current (Abs) (ID): 8 A

This well-defined maximum drain current ensures that the FET operates efficiently without overheating under specified conditions.

No. of Terminals: 3

The three-terminal configuration makes implementation straightforward in most standard switching applications.

Maximum Power Dissipation (Abs): 150 W

High power dissipation capabilities enable the FET to operate in high power environments without failure.

Package Style (Meter): FLANGE MOUNT

Flange mount design allows for secure installation and reliable thermal performance in various configurations.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology typically offers higher efficiency, lower on-resistance, and improved thermal performance.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature makes this FET suitable for high-temperature environments, ensuring reliability.

Transistor Element Material: SILICON

Silicon material is standard for reliability and availability, contributing to consistent performance in the field.

Terminal Finish: MATTE TIN

Matte tin finish enhances solderability and helps prevent oxidation, ensuring longevity and reliable connections.

Maximum Drain Current (ID): 8 A

Repeated specification emphasizes confidence in the current rating, allowing designers to rely on consistent performance.

Maximum Drain-Source On Resistance: 1 ohm

Low on-resistance translates to greater efficiency and reduced heat generation, increasing overall performance in applications.

Terminal Position: SINGLE

Single terminal position facilitates easy integration into circuit designs without complication.

Case Connection: ISOLATED

Isolated case connection enhances safety and minimizes the risk of unwanted electrical interactions.

Technical Specifications

Power Field Effect Transistors (FET) STW8NA60 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

480 mJ

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

8 A

Maximum Drain Current (ID):

8 A

Maximum Drain-Source On Resistance:

1 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

32 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW8NA60 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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