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STW8NB80

STMicroelectronics

STW8NB80 by STMicroelectronics

STW8NB80 by STMicroelectronics is an N-channel FET designed for switching applications, featuring a max drain current of 7.5 A and a breakdown voltage of 800 V. It operates in enhancement mode with a power dissipation of up to 160 W. Ideal for high-voltage circuits, it ensures reliable performance in demanding environments.

Median Price

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Lifecycle Status

Suppliers In-Stock

8

In-Stock Inventory

1k+

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Inland Empire Components Inc.

USA . 4,790 parts In-Stock

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Anansix

USA . 2,327 parts In-Stock

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Digiode

USA . 1,086 parts In-Stock

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R&J Components

USA . 428 parts In-Stock

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428

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Vectronix, Inc

USA . 200 parts In-Stock

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200

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Mentor Electronics Marketing, LLC

USA . 110 parts In-Stock

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Vyrian

USA . 77 parts In-Stock

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Fibra_Brandt Electronic GMBH

Germany . 4 parts In-Stock

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IDEA Electronic Components Group

UK . 1,394 parts In-Stock

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$1.747

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$1.572

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MKK Technologies

India . 661 parts In-Stock

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$3.285

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$3.285

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DigiPath Technology Company

USA . 661 parts In-Stock

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$3.285

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661

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Kepictronics

USA . 3,500 parts In-Stock

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Corphita

USA . 3,287 parts In-Stock

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Parana Technologies

USA . 2,151 parts In-Stock

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$2.089

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Overview

Elevate your power management solutions with the STW8NB80 from STMicroelectronics, a trusted leader in semiconductor innovation. This N-channel power FET excels in efficiency and reliability, providing robust switching capabilities for demanding applications. With an impressive breakdown voltage of 800 V and built-in diode, it enhances circuit performance while minimizing energy loss. Choose STMicroelectronics for exceptional quality and empower your designs with confidence!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package offers excellent environmental protection and reliability, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically provide higher efficiency and faster switching speeds, making them ideal for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for simplified circuit design and improved overall performance in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring optimal performance and reliability in power management.

Minimum DS Breakdown Voltage: 800 V

A high breakdown voltage enhances the device's robustness, allowing it to handle high-voltage applications safely.

Package Shape: RECTANGULAR

The rectangular shape allows for efficient layout and positioning on PCBs, improving space utilization.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide mechanical stability and are easier to solder, ensuring strong connections in high-stress environments.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for efficient control of the channel conductivity, leading to better performance in on-state conditions.

Maximum Pulsed Drain Current (IDM): 30 A

High pulsed current capacity enables the device to handle transient loads effectively, making it suitable for robust applications.

Avalanche Energy Rating (EAS): 680 mJ

A high avalanche energy rating ensures reliability under transient conditions, reducing the risk of failure during operation.

Maximum Drain Current (Abs) (ID): 7 A

This maximum current rating allows the FET to operate in various applications while maintaining operational safety and integrity.

No. of Terminals: 3

Three terminals provide the necessary connections in a compact design, facilitating easier circuit integration.

Maximum Power Dissipation (Abs): 160 W

High power dissipation capacity enables the FET to manage significant power loads without overheating, ensuring efficient operation.

Package Style (Meter): FLANGE MOUNT

Flange mount design allows for enhanced heat dissipation and secure mounting, making it ideal for demanding thermal environments.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and minimizes power consumption, benefiting low-power circuit applications.

Maximum Operating Temperature: 150 °C

A high operating temperature rating allows for use in extreme environments, expanding its potential application range.

Transistor Element Material: SILICON

Silicon provides good electrical properties, making it a common choice for high-performance transistors.

Terminal Finish: MATTE TIN

Matte tin finish ensures reliable solderability and corrosion resistance, improving the long-term performance of the part.

Maximum Drain Current (ID): 7.5 A

The slightly higher maximum drain current allows for flexibility in design, accommodating varying load requirements.

Maximum Drain-Source On Resistance: 1.6 ohm

Low on-resistance reduces power losses and increases efficiency during operation, which is critical for power applications.

Terminal Position: SINGLE

Single terminal position enhances design simplicity and minimizes cross-talk in densely packed circuits.

Technical Specifications

Power Field Effect Transistors (FET) STW8NB80 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

680 mJ

Minimum DS Breakdown Voltage:

800 V

Maximum Drain Current (Abs) (ID):

7 A

Maximum Drain Current (ID):

7.5 A

Maximum Drain-Source On Resistance:

1.6 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

30 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW8NB80 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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