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STW29NK50ZD

STMicroelectronics

STW29NK50ZD by STMicroelectronics

STW29NK50ZD by STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a 500V breakdown voltage, 29A max drain current, and 378W power dissipation. Ideal for high-efficiency power management in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 5,164 parts In-Stock

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5,164

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Digiode

USA . 4,037 parts In-Stock

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4,037

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Anansix

USA . 1,844 parts In-Stock

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1,844

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Distributors (Availability)

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IDEA Electronic Components Group

UK . 1,497 parts In-Stock

1+ parts

$1.057

100+ parts

-

1k+ parts

$0.951

10k+ parts

-

1,497

$1.057

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$0.951

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MKK Technologies

India . 135 parts In-Stock

1+ parts

$1.988

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-

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135

$1.988

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DigiPath Technology Company

USA . 135 parts In-Stock

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$1.988

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135

$1.988

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AZTECH Wire

Italy . 144 parts In-Stock

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$9.220

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144

$9.220

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A-Z Elektronik GmbH

Germany . 6,770 parts In-Stock

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6,770

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Kepictronics

USA . 5,000 parts In-Stock

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5,000

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Lixinc

USA . 3,521 parts In-Stock

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3,521

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Alle Elektronik GmbH

Germany . 3,517 parts In-Stock

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3,517

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Corphita

USA . 3,480 parts In-Stock

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3,480

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Authorized Procurement Solutions

USA . 2,000 parts In-Stock

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2,000

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Parana Technologies

USA . 1,592 parts In-Stock

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$1.264

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1,592

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$1.264

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Infinite Electronics LLP (Excess)

. 203 parts In-Stock

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Overview

Unlock a world of efficiency and reliability with the STW29NK50ZD from STMicroelectronics. This high-performance N-channel Power FET ensures optimal switching capabilities, perfect for power management in industrial applications. With ST's renowned quality and commitment to innovation, this transistor offers exceptional durability and thermal performance, empowering your designs while maximizing energy savings. Elevate your projects with unmatched value—choose STMicroelectronics for excellence!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and resistance to environmental factors, ensuring reliable performance in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher efficiency, making them ideal for high-performance switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for protection against reverse polarity, enhancing circuit reliability and reducing the need for additional components.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET ensures fast operation and efficiency in power management circuits.

Minimum DS Breakdown Voltage: 500 V

A high breakdown voltage enables the FET to operate safely in high-voltage environments, making it suitable for a wide range of industrial applications.

Package Shape: RECTANGULAR

The rectangular package shape facilitates efficient space utilization on the circuit board, optimizing layout and design flexibility.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical connections, ensuring stability and reliability in demanding applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption and higher efficiency, making this FET a good choice for energy-sensitive applications.

Maximum Pulsed Drain Current (IDM): 116 A

With a high maximum pulsed drain current, this FET can handle substantial loads, offering versatility in high-performance applications.

Avalanche Energy Rating (EAS): 500 mJ

The avalanche energy rating ensures that the device can withstand sudden energy spikes, enhancing its reliability in transient conditions.

Maximum Drain Current (Abs) (ID): 29 A

This high maximum drain current ensures the FET can effectively manage significant power levels, suitable for various power applications.

No. of Terminals: 3

The three-terminal configuration simplifies integration into circuit designs, making it easier to implement in various applications.

Maximum Power Dissipation (Abs): 378 W

A high power dissipation rating indicates that the device can handle significant heat loads, reducing the risk of thermal failure in high-power applications.

Package Style (Meter): FLANGE MOUNT

Flange mount packaging facilitates easier thermal management and secure mounting, ideal for applications requiring robust installation.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables high density and low power consumption, making this FET suitable for modern electronic applications.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can perform under demanding thermal conditions, ensuring reliable operation in tough environments.

Transistor Element Material: SILICON

Silicon is a widely used material in semiconductors, providing good performance characteristics, reliability, and cost-effectiveness.

Terminal Finish: MATTE TIN

Matte tin terminal finish reduces the risk of solder bridging and enhances solderability, improving assembly quality in manufacturing.

Maximum Drain Current (ID): 29 A

Reiterating the maximum drain current, this value ensures the FET is capable of reliable and consistent performance in demanding applications.

Maximum Drain-Source On Resistance: 0.13 ohm

Low on-resistance minimizes power loss and increases efficiency, making this FET ideal for energy-efficient applications.

Terminal Position: SINGLE

A single terminal position simplifies design and integration into circuits, making it more versatile for various applications.

Technical Specifications

Power Field Effect Transistors (FET) STW29NK50ZD attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

500 mJ

Minimum DS Breakdown Voltage:

500 V

Maximum Drain Current (Abs) (ID):

29 A

Maximum Drain Current (ID):

29 A

Maximum Drain-Source On Resistance:

.13 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247AC

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

116 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW29NK50ZD Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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