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STW200NF03

STMicroelectronics

STW200NF03 by STMicroelectronics

STW200NF03 from STMicroelectronics is an N-channel FET ideal for switching applications, featuring a max drain current of 120 A and a breakdown voltage of 30 V. It operates in enhancement mode with low on-resistance of 0.0028 Ω. This robust transistor supports high power dissipation up to 350 W.

Median Price

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Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 7,232 parts In-Stock

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Digiode

USA . 4,085 parts In-Stock

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4,085

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First Choice Components Inc.

USA . 492 parts In-Stock

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492

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Anansix

USA . 359 parts In-Stock

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359

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Electronic Expediters

USA . 20 parts In-Stock

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Sunrise Surplus Inc.

USA . 10 parts In-Stock

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IDEA Electronic Components Group

UK . 1,905 parts In-Stock

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$0.529

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$0.476

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1,905

$0.529

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$0.476

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MKK Technologies

India . 2,027 parts In-Stock

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$0.995

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$0.995

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DigiPath Technology Company

USA . 2,027 parts In-Stock

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$0.995

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$0.995

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AZTECH Wire

Italy . 764 parts In-Stock

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$13.990

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764

$13.990

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A-Z Elektronik GmbH

Germany . 5,229 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,107 parts In-Stock

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Kepictronics

USA . 3,000 parts In-Stock

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Corphita

USA . 2,177 parts In-Stock

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Authorized Procurement Solutions

USA . 2,000 parts In-Stock

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Perfect Parts

USA . 1,102 parts In-Stock

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Parana Technologies

USA . 475 parts In-Stock

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$0.632

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Overview

Unlock unparalleled performance with the STW200NF03 from STMicroelectronics, a powerhouse in Power FET technology. Designed for efficiency and reliability, this N-channel transistor excels in high-demand switching applications, offering robust capabilities and exceptional thermal management. Backed by ST's legacy of innovation, it ensures durability and optimal operation even in extreme conditions, making it the perfect choice for your next project—engineered to elevate your systems while maximizing value and energy savings.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and ensures reliable performance in various environmental conditions.

Polarity or Channel Type: N-CHANNEL

N-channel design enables higher electron mobility, resulting in better performance and efficiency in switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode offers protection against reverse voltage, which enhances the reliability of the device in power applications.

Transistor Application: SWITCHING

Designed for switching applications, this FET offers fast response times and high efficiency, making it ideal for modern power circuits.

Minimum DS Breakdown Voltage: 30 V

A minimum breakdown voltage of 30 V allows this FET to operate safely in a variety of applications without risk of breakdown.

Package Shape: RECTANGULAR

The rectangular package shape allows for efficient use of space on PCBs and supports better thermal management.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide strong mechanical connections and are suitable for high-power applications, ensuring stable and reliable operation.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation increases switching efficiency and reduces power loss during operation.

Maximum Pulsed Drain Current (IDM): 480 A

The capability to handle high pulsed currents allows this FET to manage demanding applications, enhancing its versatility.

Avalanche Energy Rating (EAS): 4000 mJ

A high avalanche energy rating indicates robust protection against transient voltages, improving reliability in harsh environments.

Maximum Drain Current (Abs) (ID): 120 A

Supports a maximum continuous drain current of 120 A, making it suitable for high-current applications.

No. of Terminals: 3

Three terminals facilitate simple connections and integration into various circuit designs, enhancing design flexibility.

Maximum Power Dissipation (Abs): 350 W

A high power dissipation rating allows for efficient heat management in power applications, contributing to longer device life.

Package Style (Meter): FLANGE MOUNT

Flange mount package style enhances thermal performance and ease of installation in high-power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance and fast switching capabilities, making this FET suitable for a wide range of applications.

Maximum Operating Temperature: 175 °C

The ability to operate at high temperatures ensures reliability in extreme conditions commonly found in power applications.

Transistor Element Material: SILICON

Silicon as the element material provides excellent electrical characteristics and temperature stability, ensuring efficient operation.

Terminal Finish: MATTE TIN

Matte tin terminal finish improves solderability and reduces the risk of oxidation, ensuring reliable electrical connections.

Maximum Drain Current (ID): 120 A

With a maximum drain current of 120 A, this FET is capable of handling substantial loads efficiently.

Maximum Drain-Source On Resistance: 0.0028 ohm

A low on-resistance allows for reduced conduction losses, improving efficiency and thermal performance in power circuits.

Terminal Position: SINGLE

A single terminal position simplifies the design process, allowing for easy integration into various circuit layouts.

Technical Specifications

Power Field Effect Transistors (FET) STW200NF03 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

4000 mJ

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

120 A

Maximum Drain Current (ID):

120 A

Maximum Drain-Source On Resistance:

.0028 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-247AC

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

480 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STW200NF03 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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