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STP4NB100

STMicroelectronics

STP4NB100 by STMicroelectronics

STP4NB100 by STMicroelectronics is a N-CHANNEL FET with 1000V DS Breakdown Voltage, ideal for SWITCHING applications. Features include 15.2A IDM, 360mJ EAS, and 125W Max Power Dissipation. Suitable for high-power ENHANCEMENT MODE operations in various electronic systems.

Median Price

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Lifecycle Status

Suppliers In-Stock

9

In-Stock Inventory

1k+

Distributors (In-Stock)

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Digiode

USA . 4,649 parts In-Stock

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Vyrian

USA . 4,542 parts In-Stock

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Flex Direct, LLC

USA . 1,062 parts In-Stock

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1,062

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Bristol Electronics

USA . 1,002 parts In-Stock

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Anansix

USA . 136 parts In-Stock

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Fibra_Brandt Electronic GMBH

Germany . 55 parts In-Stock

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MISTER SPROCKETS

USA . 22 parts In-Stock

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GES GmbH

Germany . 6 parts In-Stock

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Cogito LLC

Ukraine . 3 parts In-Stock

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IDEA Electronic Components Group

UK . 1,055 parts In-Stock

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$1.181

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$1.063

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$1.181

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MKK Technologies

India . 1,016 parts In-Stock

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$2.221

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DigiPath Technology Company

USA . 1,016 parts In-Stock

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$2.221

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AZTECH Wire

Italy . 1,035 parts In-Stock

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$13.220

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Component Stockers USA

USA . 275 parts In-Stock

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$99.990

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A-Z Elektronik GmbH

Germany . 7,353 parts In-Stock

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Authorized Procurement Solutions

USA . 5,000 parts In-Stock

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Kepictronics

USA . 4,631 parts In-Stock

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Alle Elektronik GmbH

Germany . 4,165 parts In-Stock

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Corphita

USA . 1,843 parts In-Stock

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Parana Technologies

USA . 544 parts In-Stock

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$1.412

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Overview

Elevate your power system with the STP4NB100 by STMicroelectronics. As a leading manufacturer in the industry, STMicroelectronics delivers top-notch quality and reliability in every product. The STP4NB100 is a game-changer in the Power Field Effect Transistor category, featuring N-CHANNEL polarity, a built-in diode, and impressive 1000 V minimum DS breakdown voltage. Perfect for switching applications, this transistor offers superior performance with its 15.2 A maximum pulsed drain current and 360 mJ avalanche energy rating. Trust in STMicroelectronics to provide cutting-edge technology that exceeds expectations and enhances your projects.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides excellent insulation and protection for the internal components of the FET, ensuring long-term durability and reliability.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically have lower ON resistance and higher current-carrying capabilities compared to P-Channel FETs, making them suitable for high-power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for easier and more efficient switching applications, reducing the need for external components and simplifying circuit design.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can rapidly switch between on and off states, making it ideal for power control and conversion.

Minimum DS Breakdown Voltage: 1000 V

With a high breakdown voltage, this FET can handle high voltage applications without risking damage to the internal components, ensuring safety and reliability.

Maximum Drain-Source On Resistance: 4.4 ohm

Low ON resistance allows for efficient power delivery and minimal power loss, making this FET an energy-efficient choice for high-current applications.

Maximum Power Dissiption (Abs): 125 W

With a high power dissipation rating, this FET can handle high power loads without overheating, ensuring stable performance under demanding conditions.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can withstand elevated temperatures without compromising performance, making it suitable for industrial and automotive applications.

Technical Specifications

Power Field Effect Transistors (FET) STP4NB100 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

360 mJ

Minimum DS Breakdown Voltage:

1000 V

Maximum Drain Current (Abs) (ID):

3.8 A

Maximum Drain Current (ID):

3.8 A

Maximum Drain-Source On Resistance:

4.4 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-220AB

JESD-30 Code:

R-PSFM-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

15.2 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STP4NB100 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

NSN

5961-01-601-6654, 5961016016654

NIIN

016016654

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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