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NXH040F120MNF1PG

Onsemi

NXH040F120MNF1PG by Onsemi

NXH040F120MNF1PG by Onsemi is a N-CHANNEL Power FET with 1200V DS Breakdown Voltage, 90A IDM, and 0.056 ohm RDS(on). It is used for SWITCHING applications in ENHANCEMENT MODE. This RECTANGULAR package has 4 elements with built-in diode and thermistor, ideal for high-power operations up to 175°C.

Median Price

$82.738

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

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DigiKey

USA . 26 parts In-Stock

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$91.090

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$73.920

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Verical

USA . 28 parts In-Stock

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$74.385

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Nova Conductors

Japan . 50 parts In-Stock

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$86.580

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Vyrian

USA . 4,439 parts In-Stock

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Digiode

USA . 2,460 parts In-Stock

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Flip Electronics

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Semicontronic

India . 810 parts In-Stock

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$4.050

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$3.949

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$3.928

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810

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$3.928

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AZTECH Wire

Italy . 776 parts In-Stock

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$18.668

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Ampacity Inc.

Singapore . 1,356 parts In-Stock

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$42.050

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Corohmni

South Africa . 440 parts In-Stock

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$84.848

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Bastille Electronics

Australia . 58 parts In-Stock

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$86.580

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$82.251

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$77.056

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Continental Prestige Electronics

USA . 5,099 parts In-Stock

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$86.580

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SupplyDigital Components

Austria . 8,334 parts In-Stock

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Kulean Microsystems

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Problanco Electronics

Mexico . 5,475 parts In-Stock

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Argo Parts USA

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TANS Electronics

Latvia . 2,412 parts In-Stock

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Corphita

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UHIMA Technologies

Türkiye . 330 parts In-Stock

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Overview

Experience the power of innovation with the NXH040F120MNF1PG by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-quality Power Field Effect Transistors that are perfect for switching applications. This N-CHANNEL transistor offers a groundbreaking design with built-in diodes and thermistors for enhanced performance. With a high DS Breakdown Voltage of 1200V and a maximum Pulsed Drain Current of 90A, this transistor ensures reliable operation even in the most demanding conditions. Trust Onsemi to provide cutting-edge technology that brings value and efficiency to your projects. Choose the NXH040F120MNF1PG and elevate your applications to new heights.

Feature Benefit Bullets

Polarity/Channel Type: N-CHANNEL

N-CHANNEL FETs have lower ON resistance and higher electron mobility, making them ideal for high-power applications.

Configuration: BRIDGE, 4 ELEMENTS WITH BUILT-IN DIODE AND THERMISTOR

The built-in diode and thermistor enhance efficiency and provide additional protection, making the FETs more reliable in various operating conditions.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast and efficient performance when turning on/off high-voltage circuits.

Minimum DS Breakdown Voltage: 1200 V

High breakdown voltage allows the FETs to handle high voltages, increasing the range of applications they can be used for.

Maximum Pulsed Drain Current (IDM): 90 A

High pulsed drain current capability ensures the FETs can handle sudden spikes in current without getting damaged.

Maximum Power Dissipation (Abs): 74 W

With a high power dissipation rating, the FETs can handle significant power levels without overheating.

Maximum Operating Temperature: 175 °C

The high operating temperature range allows the FETs to be used in a variety of environments without losing performance.

Maximum Drain-Source On Resistance: 0.056 ohm

Low ON resistance leads to lower power losses and improved efficiency in high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) NXH040F120MNF1PG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

1200 V

Maximum Drain Current (ID):

30 A

Maximum Drain-Source On Resistance:

.056 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

12 pF

JESD-30 Code:

R-XUFM-X22

No. of Elements:

4

No. of Terminals:

22

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-40 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

90 A

Surface Mount:

NO

Terminal Form:

UNSPECIFIED

Terminal Position:

UPPER

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON CARBIDE

Trade Compliance

NXH040F120MNF1PG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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