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NXH010P120MNF1PTNG

Onsemi

NXH010P120MNF1PTNG by Onsemi

NXH010P120MNF1PTNG by Onsemi is a N-CHANNEL FET with 1200V DS Breakdown Voltage, 342A IDM, and 0.014 ohm RDS(on). Ideal for SWITCHING applications, it features SERIES CONNECTED configuration with METAL-OXIDE SEMICONDUCTOR technology. Operating from -40 to 175 °C, this RECTANGULAR package has 18 terminals and a max power dissipation of 250W.

Median Price

$112.595

Lifecycle Status

Suppliers In-Stock

7

In-Stock Inventory

1k+

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DigiKey

USA . 25 parts In-Stock

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$120.290

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$103.026

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Future Electronics

Canada . 28 parts In-Stock

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$104.900

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Digiode

USA . 1,949 parts In-Stock

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Vyrian

USA . 5,785 parts In-Stock

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Flip Electronics

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NAC Semi

USA . 56 parts In-Stock

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IBS Electronics

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Corphita

USA . 1,952 parts In-Stock

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$92.727

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Corohmni

South Africa . 53 parts In-Stock

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$100.570

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Microchip USA

USA . 9,622 parts In-Stock

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SupplyDigital Components

Austria . 4,055 parts In-Stock

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TANS Electronics

Latvia . 3,811 parts In-Stock

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Problanco Electronics

Mexico . 2,915 parts In-Stock

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Kulean Microsystems

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UHIMA Technologies

Türkiye . 561 parts In-Stock

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Overview

Discover the power of the NXH010P120MNF1PTNG by Onsemi, a high-quality N-channel Power FET designed for switching applications. With a minimum DS breakdown voltage of 1200V and maximum drain current of 114A, this transistor offers exceptional performance and reliability. The innovative design features two elements with built-in diode and thermistor, providing enhanced functionality and efficiency. Ideal for a wide range of applications, this product from Onsemi delivers value, benefits, and advantages that will exceed your expectations. Elevate your projects with the NXH010P120MNF1PTNG and experience superior performance like never before.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs typically have better performance and lower resistance compared to P-Channel FETs, making them a good choice for high power applications.

Configuration: SERIES CONNECTED, CENTER TAP, 2 ELEMENTS WITH BUILT-IN DIODE AND THERMISTOR

This configuration allows for improved efficiency and reliability in switching applications, making the product suitable for demanding environments.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast response times and efficient operation.

Minimum DS Breakdown Voltage: 1200 V

With a high breakdown voltage, this FET can handle high voltages without damage, making it suitable for industrial and power electronics applications.

Maximum Pulsed Drain Current (IDM): 342 A

The high pulsed drain current rating allows the FET to handle large current surges, making it ideal for applications with high peak power requirements.

Maximum Power Dissipation (Abs): 250 W

The high power dissipation capability ensures reliable operation under high load conditions, making it suitable for power management applications.

Maximum Drain Current (ID): 114 A

With a high drain current rating, this FET can handle large continuous current flows, making it suitable for high power applications.

Technical Specifications

Power Field Effect Transistors (FET) NXH010P120MNF1PTNG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

1200 V

Maximum Drain Current (ID):

114 A

Maximum Drain-Source On Resistance:

.014 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

39 pF

JESD-30 Code:

R-XUFM-X18

No. of Elements:

2

No. of Terminals:

18

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-40 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

342 A

Surface Mount:

NO

Terminal Form:

UNSPECIFIED

Terminal Position:

UPPER

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON CARBIDE

Trade Compliance

NXH010P120MNF1PTNG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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