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NXH020P120MNF1PG

Onsemi

NXH020P120MNF1PG by Onsemi

NXH020P120MNF1PG by Onsemi is a N-CHANNEL FET with 1200V DS breakdown voltage, 153A IDM, and 0.03ohm RDS(on). Ideal for switching applications, it features SERIES CONNECTED configuration with 2 elements, built-in diode & thermistor. Operating in enhancement mode, this MOSFET has a max power dissipation of 119W and operates b/w -40 to 175 °C.

Median Price

$122.190

Lifecycle Status

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5

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1k+

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DigiKey

USA . 28 parts In-Stock

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Mouser Electronics

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Vyrian

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Problanco Electronics

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Corphita

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UHIMA Technologies

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Corohmni

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Kulean Microsystems

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Overview

Experience the power of innovation with the NXH020P120MNF1PG by Onsemi. As a leading manufacturer in the field of Power Field Effect Transistors, Onsemi delivers top-quality products designed for switching applications. With a minimum DS breakdown voltage of 1200V and maximum pulsing drain current of 153A, this N-CHANNEL transistor offers unparalleled performance and reliability. Whether you're in the automotive, industrial, or renewable energy sector, the NXH020P120MNF1PG provides the perfect solution for your power management needs. Trust Onsemi to deliver cutting-edge technology that brings value and efficiency to your projects.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically have lower ON-resistance compared to P-Channel FETs, making them a good choice for high-power applications.

Minimum DS Breakdown Voltage: 1200 V

With a high breakdown voltage, this FET can handle high voltage applications, providing a reliable switch for power control.

Maximum Pulsed Drain Current (IDM): 153 A

The high pulsed drain current capability allows this FET to handle large currents during short periods, making it suitable for high-power switching applications.

Maximum Power Dissipation (Abs): 119 W

The high power dissipation rating ensures that the FET can handle the heat generated during operation, ensuring reliability and longevity.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-Oxide Semiconductor FETs are known for their high input impedance and low input capacitance, making them efficient switches for various applications.

Technical Specifications

Power Field Effect Transistors (FET) NXH020P120MNF1PG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

ISOLATED

Minimum DS Breakdown Voltage:

1200 V

Maximum Drain Current (ID):

51 A

Maximum Drain-Source On Resistance:

.03 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

19 pF

JESD-30 Code:

R-XUFM-X18

No. of Elements:

2

No. of Terminals:

18

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-40 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

153 A

Surface Mount:

NO

Terminal Form:

UNSPECIFIED

Terminal Position:

UPPER

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON CARBIDE

Trade Compliance

NXH020P120MNF1PG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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