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NVMTS003N10MCTXG

Onsemi

NVMTS003N10MCTXG by Onsemi

NVMTS003N10MCTXG by Onsemi is a N-CHANNEL FET with 100V DS Breakdown Voltage and 125A ID. Ideal for power applications, it operates in Enhancement Mode with 0.003 ohm RDS(ON) and 94W Power Dissipation. AEC-Q101 compliant, it suits automotive and industrial sectors due to its high current handling capabilities.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 1,206 parts In-Stock

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Digiode

USA . 492 parts In-Stock

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TANS Electronics

Latvia . 5,569 parts In-Stock

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Problanco Electronics

Mexico . 4,596 parts In-Stock

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SupplyDigital Components

Austria . 3,171 parts In-Stock

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Kulean Microsystems

USA . 2,197 parts In-Stock

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Corphita

USA . 1,407 parts In-Stock

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UHIMA Technologies

Türkiye . 609 parts In-Stock

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Corohmni

South Africa . 419 parts In-Stock

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Overview

Unleash the power of innovation with the NVMTS003N10MCTXG by Onsemi, a leading manufacturer in the field of Power Field Effect Transistors (FET). This N-CHANNEL transistor offers unparalleled quality and reliability, making it perfect for a wide range of applications. From enhancing performance in automotive systems to optimizing power management in industrial settings, this transistor delivers exceptional value and benefits to customers. Trust Onsemi to provide cutting-edge technology and superior products that exceed expectations.

Feature Benefit Bullets

Polarity/Channel Type: N-CHANNEL

N-CHANNEL FETs typically have higher electron mobility, which results in better performance and efficiency compared to P-CHANNEL FETs.

Minimum DS Breakdown Voltage: 100 V

This high breakdown voltage ensures reliable operation in high voltage applications, providing better durability and protection.

Operating Mode: ENHANCEMENT MODE

Enhancement mode transistors are easier to control and operate in comparison to depletion mode transistors, offering more precise switching and control.

Maximum Drain Current (ID): 125 A

This high drain current capability allows for handling larger loads and higher power applications, making the FET suitable for demanding scenarios.

Maximum Power Dissipation (Pd): 94 W

The high power dissipation capacity ensures that the FET can withstand and dissipate heat generated during operation, preventing overheating and damage.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFETs are known for their fast switching speeds, low on-resistance, and high input impedance, making them ideal for high-frequency and high-power applications.

Maximum Operating Temperature: 175 °C

The high maximum operating temperature allows the FET to be used in a wide range of environments and applications, ensuring reliable performance even in elevated temperatures.

Terminal Finish: Matte Tin (Sn)

Matte tin finish provides good solderability, ensuring secure and reliable connections during PCB assembly.

Maximum Drain-Source On Resistance: 0.003 ohm

The low on-resistance results in minimal power loss and heat generation, leading to higher efficiency and improved overall performance.

Maximum Feedback Capacitance (Crss): 45 pF

Low feedback capacitance helps reduce switching losses and improves high-frequency performance, making the FET suitable for fast switching applications.

Reference Standard: AEC-Q101

Compliance with AEC-Q101 ensures that the FET meets automotive-grade reliability and quality standards, making it suitable for automotive applications.

Technical Specifications

Power Field Effect Transistors (FET) NVMTS003N10MCTXG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

125 A

Maximum Drain Current (ID):

125 A

Maximum Drain-Source On Resistance:

.003 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

45 pF

JESD-609 Code:

e3

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Reference Standard:

AEC-Q101

Terminal Finish:

Matte Tin (Sn)

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Element Material:

SILICON

Trade Compliance

NVMTS003N10MCTXG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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