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NVMTS001N04M8TXG

Onsemi

NVMTS001N04M8TXG by Onsemi

NVMTS001N04M8TXG by Onsemi is a N-CHANNEL FET with 40V DS Breakdown Voltage, 354A ID, and 0.001 ohm RDS(ON). Ideal for power applications in automotive (AEC-Q101) and industrial sectors due to its high current handling capacity and low on-resistance. Operating from -55 °C to 175°C, it offers reliable performance in harsh environments.

Median Price

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Digiode

USA . 2,278 parts In-Stock

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Vyrian

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SupplyDigital Components

Austria . 7,618 parts In-Stock

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Kulean Microsystems

USA . 7,040 parts In-Stock

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TANS Electronics

Latvia . 2,551 parts In-Stock

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Problanco Electronics

Mexico . 571 parts In-Stock

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Corphita

USA . 382 parts In-Stock

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UHIMA Technologies

Türkiye . 362 parts In-Stock

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Corohmni

South Africa . 155 parts In-Stock

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Overview

Unlock the power of innovation with the NVMTS001N04M8TXG by Onsemi. Built with precision and expertise, this N-CHANNEL Power Field Effect Transistor offers unparalleled reliability and performance. Ideal for a variety of applications, this transistor provides enhanced efficiency and durability. Experience seamless operation, high power dissipation, and low resistance with this cutting-edge technology. Elevate your projects with the quality and value that only Onsemi can deliver.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are known for their low conduction losses and high efficiency, making them a good choice for power applications.

Minimum DS Breakdown Voltage: 40 V

Higher breakdown voltage ensures reliability and protection against voltage spikes, making this FET suitable for high voltage applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode allows for efficient freewheeling of inductive loads, improving overall system performance and reducing complexity.

Maximum Drain Current (Abs) (ID): 354 A

High drain current rating allows for handling high power loads, making it suitable for industrial and automotive applications.

Maximum Power Dissipation (Abs): 250 W

High power dissipation capability ensures reliable operation under high load conditions, making it suitable for power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high speed switching and low drive power requirements, making it ideal for high-frequency applications.

Maximum Operating Temperature: 175 °C

Higher operating temperature range allows for operation in harsh environments, enhancing the reliability of the product.

Transistor Element Material: SILICON

Silicon-based FETs offer good thermal conductivity and high breakdown voltage, ensuring reliable performance in power applications.

Maximum Drain-Source On Resistance: 0.001 ohm

Low on-resistance results in reduced power losses and improved efficiency, making it suitable for high-power applications.

Maximum Feedback Capacitance (Crss): 115 pF

Low feedback capacitance allows for faster switching speeds, reducing switching losses and improving overall efficiency.

Reference Standard: AEC-Q101

Compliance with AEC-Q101 standard ensures high reliability and quality, making it suitable for automotive applications where robustness is crucial.

Technical Specifications

Power Field Effect Transistors (FET) NVMTS001N04M8TXG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

354 A

Maximum Drain Current (ID):

354 A

Maximum Drain-Source On Resistance:

.001 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

115 pF

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Reference Standard:

AEC-Q101

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Element Material:

SILICON

Trade Compliance

NVMTS001N04M8TXG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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