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NVMTS1D3P04M8LTXG

Onsemi

NVMTS1D3P04M8LTXG by Onsemi

NVMTS1D3P04M8LTXG by Onsemi is a P-CHANNEL FET with 40V DS Breakdown Voltage, 361A ID, and 300W Power Dissipation. Ideal for automotive applications due to AEC-Q101 compliance, it operates in Enhancement Mode with -55 to 175 °C temperature range.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 1,249 parts In-Stock

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Vyrian

USA . 274 parts In-Stock

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Kulean Microsystems

USA . 7,255 parts In-Stock

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TANS Electronics

Latvia . 5,864 parts In-Stock

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SupplyDigital Components

Austria . 2,964 parts In-Stock

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Problanco Electronics

Mexico . 1,695 parts In-Stock

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Corphita

USA . 656 parts In-Stock

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UHIMA Technologies

Türkiye . 438 parts In-Stock

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Corohmni

South Africa . 415 parts In-Stock

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Overview

Discover the unparalleled performance and reliability of the NVMTS1D3P04M8LTXG by Onsemi. As a leading manufacturer in the field of Power Field Effect Transistors, Onsemi delivers top-quality products that exceed industry standards. Ideal for various applications, this P-CHANNEL FET offers exceptional value with its high efficiency, maximum power dissipation, and wide operating temperature range. Trust Onsemi to provide you with cutting-edge technology and superior performance for all your electrical needs.

Feature Benefit Bullets

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low on-state resistance and high current carrying capabilities, making them suitable for high-power applications.

Minimum DS Breakdown Voltage: 40 V

The high breakdown voltage ensures reliability in high voltage applications, providing protection against voltage spikes.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer easy control of the current flow, making them ideal for power switching applications where precise control is required.

Maximum Drain Current (Abs) (ID): 361 A

The high drain current rating allows the FET to handle heavy loads without overheating, making it suitable for high-power circuits.

Maximum Power Dissipation (Abs): 300 W

The high power dissipation capability ensures that the FET can handle high power levels without being damaged, making it reliable in demanding applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers high efficiency and fast switching speeds, making the FET energy-efficient and suitable for high-frequency applications.

Maximum Operating Temperature: 175 °C

The high operating temperature range allows the FET to operate in harsh environmental conditions without performance degradation, enhancing its reliability.

Transistor Element Material: SILICON

Silicon-based FETs are known for their high thermal conductivity and stability, making them suitable for high-power applications where heat dissipation is critical.

Terminal Finish: MATTE TIN

Matte tin finish provides good solderability and corrosion resistance, ensuring a reliable electrical connection and prolonging the FET's lifespan.

Maximum Drain-Source On Resistance: 0.019 ohm

Low on-state resistance minimizes power loss and heat generation, improving the efficiency of the FET and making it suitable for high power applications.

Maximum Feedback Capacitance (Crss): 410 pF

Low feedback capacitance reduces the risk of oscillations and improves stability in high-frequency circuits, making the FET reliable in high-speed applications.

Reference Standard: AEC-Q101

Compliance with AEC-Q101 ensures that the FET meets automotive quality standards, making it suitable for use in automotive applications where reliability is critical.

Technical Specifications

Power Field Effect Transistors (FET) NVMTS1D3P04M8LTXG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

361 A

Maximum Drain Current (ID):

361 A

Maximum Drain-Source On Resistance:

.019 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

410 pF

JESD-609 Code:

e3

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Reference Standard:

AEC-Q101

Terminal Finish:

MATTE TIN

Transistor Element Material:

SILICON

Trade Compliance

NVMTS1D3P04M8LTXG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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