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NVMTS0D7N04M8TXG

Onsemi

NVMTS0D7N04M8TXG by Onsemi

NVMTS0D7N04M8TXG by Onsemi is a N-CHANNEL Power FET with 40V DS Breakdown Voltage and 445A ID. Ideal for high-power applications, it features a built-in diode, 0.0007 ohm RDS(on), and 180pF Crss. Operating in enhancement mode, this MOSFET has a max power dissipation of 278W and can withstand temperatures from -55 to 175 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 2,108 parts In-Stock

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Vyrian

USA . 2,036 parts In-Stock

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2,036

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Kulean Microsystems

USA . 7,669 parts In-Stock

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TANS Electronics

Latvia . 6,478 parts In-Stock

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SupplyDigital Components

Austria . 4,310 parts In-Stock

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Problanco Electronics

Mexico . 3,971 parts In-Stock

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Corphita

USA . 1,061 parts In-Stock

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UHIMA Technologies

Türkiye . 309 parts In-Stock

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Corohmni

South Africa . 285 parts In-Stock

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Overview

Unlock the power of the future with the NVMTS0D7N04M8TXG by Onsemi. As a leader in the industry, Onsemi delivers top-quality Power Field Effect Transistors that are perfect for a wide range of applications. Whether you're looking to enhance your electronic devices or improve energy efficiency, this N-CHANNEL FET with a built-in diode is the solution you need. With maximum drain current of 445A and a minimum DS breakdown voltage of 40V, this transistor offers unmatched performance and reliability. Trust Onsemi to provide the best technology for your needs.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs have higher electron mobility and lower on-resistance, making them more efficient for high power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for protection against reverse current flow, increasing the reliability of the FET.

Minimum DS Breakdown Voltage: 40 V

The high breakdown voltage allows for the FET to handle higher voltages without breakdown, improving the durability and safety of the device.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are easier to control and typically have lower on-resistance, leading to better performance in various applications.

Maximum Drain Current (Abs): 445 A

The high maximum drain current allows for the FET to handle high power loads, making it suitable for high current applications.

Maximum Power Dissipation (Abs): 278 W

The high power dissipation rating ensures that the FET can dissipate heat effectively, preventing overheating and maintaining reliability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers high switching speeds, low on-resistance, and high input impedance, making it suitable for a wide range of applications.

Maximum Operating Temperature: 175 °C

The high maximum operating temperature allows for the FET to be used in environments with elevated temperatures without risk of damage.

Transistor Element Material: SILICON

Silicon FETs are widely used due to their reliability, high temperature tolerance, and compatibility with existing manufacturing processes.

Maximum Drain-Source On Resistance: 0.0007 ohm

The low on-resistance minimizes power losses and improves efficiency in power conversion applications.

Maximum Feedback Capacitance (Crss): 180 pF

Low feedback capacitance allows for faster switching speeds and reduces the risk of parasitic oscillations in high frequency applications.

Reference Standard: AEC-Q101

Compliance with the AEC-Q101 standard ensures that the FET meets automotive-grade reliability and quality requirements, making it suitable for automotive applications.

Technical Specifications

Power Field Effect Transistors (FET) NVMTS0D7N04M8TXG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

445 A

Maximum Drain Current (ID):

445 A

Maximum Drain-Source On Resistance:

.0007 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

180 pF

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Reference Standard:

AEC-Q101

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Element Material:

SILICON

Trade Compliance

NVMTS0D7N04M8TXG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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