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NTMD3N08

Onsemi

NTMD3N08 by Onsemi

NTMD3N08 by Onsemi is a N-CHANNEL Power FET with 80V DS Breakdown Voltage. It features 0.185 ohm RDS(on) for SWITCHING applications in ENHANCEMENT MODE. This 8-terminal transistor has a GULL WING package style suitable for surface mount technology.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 2,296 parts In-Stock

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Digiode

USA . 1,149 parts In-Stock

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Kulean Microsystems

USA . 7,095 parts In-Stock

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SupplyDigital Components

Austria . 5,115 parts In-Stock

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Problanco Electronics

Mexico . 3,016 parts In-Stock

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Corphita

USA . 1,431 parts In-Stock

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UHIMA Technologies

Türkiye . 838 parts In-Stock

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TANS Electronics

Latvia . 474 parts In-Stock

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Corohmni

South Africa . 223 parts In-Stock

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Overview

Looking for a reliable power FET for your switching applications? Look no further than the Onsemi NTMD3N08. With its high-quality construction and N-channel configuration, this transistor offers exceptional performance and durability. Whether you're designing industrial equipment or consumer electronics, this FET is sure to meet your needs with its 80V breakdown voltage and low on-resistance. Trust in Onsemi's expertise and choose the NTMD3N08 for your next project.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

PLASTIC/EPOXY material makes the package lightweight and durable, ideal for portable and long-lasting applications.

Polarity or Channel Type: N-CHANNEL

N-CHANNEL type provides efficient and reliable switching capabilities, suitable for a variety of electronic devices.

Configuration: SEPARATE, 2 ELEMENTS

Having separate 2 elements allows for better control and flexibility in circuit design, optimizing performance.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast operation and low power consumption.

Surface Mount: YES

Surface mount capability enables easy and efficient installation on PCBs, saving space and reducing assembly time.

Minimum DS Breakdown Voltage: 80 V

With a minimum breakdown voltage of 80V, this product can handle higher voltages, increasing its versatility in power circuitry.

Terminal Form: GULL WING

GULL WING terminal form facilitates secure soldering connections, ensuring reliable electrical contacts.

Operating Mode: ENHANCEMENT MODE

ENHANCEMENT MODE operation provides enhanced control over the transistor's conductivity, enabling precise switching control.

No. of Elements: 2

Having 2 elements offers redundancy and increased performance capabilities, improving the overall reliability of the device.

No. of Terminals: 8

8 terminals provide more connection options, enabling complex circuit designs and functionality.

Package Style (Meter): SMALL OUTLINE

SMALL OUTLINE package style saves space and allows for compact designs, suitable for applications with limited space.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

METAL-OXIDE SEMICONDUCTOR technology offers high efficiency and reliability, ensuring stable performance over time.

Transistor Element Material: SILICON

SILICON material provides excellent thermal stability and electrical properties, essential for long-term device operation.

Terminal Finish: TIN LEAD

TIN LEAD terminal finish resists corrosion and oxidation, maintaining electrical conductivity and ensuring long-term reliability.

Maximum Drain-Source On Resistance: 0.185 ohm

Low maximum on-resistance of 0.185 ohm minimizes power losses and heat generation, maximizing efficiency in power applications.

Terminal Position: DUAL

Dual terminal position provides multiple connection options, allowing for versatile circuit configurations and applications.

Technical Specifications

Power Field Effect Transistors (FET) NTMD3N08 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Minimum DS Breakdown Voltage:

80 V

Maximum Drain-Source On Resistance:

.185 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e0

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMD3N08 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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