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NTMD2P01R2G

Onsemi

NTMD2P01R2G by Onsemi

NTMD2P01R2G by Onsemi is a P-CHANNEL FET with 16V DS breakdown voltage, 9A IDM, and 0.1 ohm RDS(on). It's used for switching applications in small outline packages with 8 terminals.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Chip Stock

USA . 29,000 parts In-Stock

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Vyrian

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Digiode

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AZTECH Wire

Italy . 722 parts In-Stock

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Metaverse IC Inc.

Canada . 85,000 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 18,147 parts In-Stock

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Kepictronics

USA . 10,065 parts In-Stock

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Authorized Procurement Solutions

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Kulean Microsystems

USA . 7,788 parts In-Stock

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SupplyDigital Components

Austria . 6,306 parts In-Stock

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A-Z Elektronik GmbH

Germany . 6,288 parts In-Stock

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Problanco Electronics

Mexico . 5,632 parts In-Stock

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TANS Electronics

Latvia . 4,590 parts In-Stock

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Corphita

USA . 2,347 parts In-Stock

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UHIMA Technologies

Türkiye . 791 parts In-Stock

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Corohmni

South Africa . 253 parts In-Stock

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Overview

Experience the power of innovation with the NTMD2P01R2G by Onsemi. As a leader in the industry, Onsemi delivers top-quality Power Field Effect Transistors like no other. This P-Channel transistor offers unmatched reliability and efficiency for switching applications. With its separate configuration and built-in diode, this transistor provides superior performance for your electronic designs. Say goodbye to power limitations and hello to unlimited possibilities with the NTMD2P01R2G. Trust Onsemi to take your projects to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material makes the product lightweight and durable, making it suitable for a wide range of applications.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low on-resistance and high current-handling capabilities, making this product efficient for switching applications.

Minimum DS Breakdown Voltage: 16 V

With a minimum breakdown voltage of 16 V, this FET can handle higher voltages without breakdown, ensuring reliable operation in various conditions.

Maximum Pulsed Drain Current (IDM): 9 A

The high pulsed drain current rating of 9 A allows the FET to handle sudden surges in current, making it suitable for applications requiring a high level of power.

Maximum Power Dissipation (Abs): 0.71 W

The low power dissipation helps in keeping the FET cool during operation, leading to improved efficiency and reliability.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature of 150 °C, this FET can withstand elevated temperatures, making it suitable for use in demanding environments.

Technical Specifications

Power Field Effect Transistors (FET) NTMD2P01R2G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Avalanche Energy Rating (EAS):

350 mJ

Minimum DS Breakdown Voltage:

16 V

Maximum Drain Current (Abs) (ID):

2.3 A

Maximum Drain Current (ID):

2.3 A

Maximum Drain-Source On Resistance:

.1 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

9 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMD2P01R2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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