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NTMD6N03R2G

Onsemi

NTMD6N03R2G by Onsemi

NTMD6N03R2G by Onsemi is a N-CHANNEL FET with 30V DS breakdown voltage, 6A max drain current, and 0.032 ohm RDS(on). Ideal for switching applications, it features separate elements with built-in diode in a small outline package. Operating in enhancement mode, it has an avalanche energy rating of 325mJ and can handle up to 30A pulsed drain current.

Median Price

$0.393

Lifecycle Status

Suppliers In-Stock

16

In-Stock Inventory

1k+

Distributors (Authorized)

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DigiKey

USA . 15,000 parts In-Stock

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$0.240

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Flip Electronics (Authorized)

USA . 15,000 parts In-Stock

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Rochester

USA . 11,319 parts In-Stock

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$0.386

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$0.320

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$0.285

11,319

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$0.386

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$0.285

Verical

USA . 6,950 parts In-Stock

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$0.400

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$0.357

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Farnell

UK . 3,507 parts In-Stock

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$0.734

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$0.463

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$0.400

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Distributors (In-Stock)

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Vyrian

USA . 83 parts In-Stock

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Digiode

USA . 1,987 parts In-Stock

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$0.344

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Chip Stock

USA . 48,000 parts In-Stock

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Flip Electronics

USA . 15,000 parts In-Stock

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Cyclops Electronics Ltd

UK . 12,752 parts In-Stock

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Bristol Electronics

USA . 8,961 parts In-Stock

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Semi Source

USA . 2,430 parts In-Stock

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Sea View Technologies

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Sogenti Electronics

Canada . 1,857 parts In-Stock

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A&K Electronics

USA . 1,580 parts In-Stock

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Rotakorn

Sweden . 1,580 parts In-Stock

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Corohmni

South Africa . 419 parts In-Stock

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$0.310

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Corphita

USA . 1,168 parts In-Stock

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$0.326

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Perfect Parts

USA . 223,366 parts In-Stock

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Metaverse IC Inc.

Canada . 99,000 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

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Lixinc

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A-Z Elektronik GmbH

Germany . 5,439 parts In-Stock

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Authorized Procurement Solutions

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Kulean Microsystems

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SupplyDigital Components

Austria . 3,907 parts In-Stock

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GreenTree Electronics

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Continental Prestige Electronics

USA . 2,500 parts In-Stock

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Problanco Electronics

Mexico . 2,479 parts In-Stock

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ChipstoGo Electronic ltd

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Assy Fe

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UHIMA Technologies

Türkiye . 646 parts In-Stock

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Futuretech Components

Singapore . 507 parts In-Stock

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TANS Electronics

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Overview

Unlock the power of the NTMD6N03R2G by Onsemi, a top-of-the-line Power Field Effect Transistor perfect for switching applications. With Onsemi's reputation for quality and reliability, you can trust that this N-CHANNEL transistor will exceed your expectations. Boasting a maximum pulsing drain current of 30 A and a low on-resistance of 0.032 ohm, this transistor offers unmatched performance and efficiency. Whether you're designing a new circuit or upgrading existing systems, the NTMD6N03R2G provides the value and benefits you need to succeed. Experience the difference with Onsemi today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material in the package body makes the FET lightweight and durable, ensuring long-lasting performance in various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower ON-resistance and higher efficiency compared to P-channel FETs, making them a good choice for applications requiring high performance.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this FET can handle higher voltage applications without the risk of failure, providing reliable operation.

Maximum Pulsed Drain Current (IDM): 30 A

The high pulsed drain current rating of 30A allows this FET to handle sudden spikes in current, making it suitable for applications with varying loads.

Maximum Power Dissipation (Abs): 2 W

With a maximum power dissipation of 2W, this FET can efficiently dissipate heat generated during operation, ensuring optimal performance and reliability.

Maximum Operating Temperature: 150 °C

The FET can operate at temperatures up to 150°C, allowing it to be used in high-temperature environments without compromising performance.

Technical Specifications

Power Field Effect Transistors (FET) NTMD6N03R2G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

325 mJ

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

6 A

Maximum Drain Current (ID):

6 A

Maximum Drain-Source On Resistance:

.032 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

2 W

Maximum Pulsed Drain Current (IDM):

30 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Powers

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMD6N03R2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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