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NTMD4N03R2

Onsemi

NTMD4N03R2 by Onsemi

NTMD4N03R2 by Onsemi is a N-CHANNEL FET with 30V DS Breakdown Voltage, 12A IDM, and 0.06 ohm RDS(on). Ideal for SWITCHING applications in small outline packages with 8 terminals. Operating at up to 150 °C, it offers high power dissipation of 2W and an EAS of 80mJ.

Median Price

$0.225

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

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Rochester

USA . 15 parts In-Stock

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$0.225

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$0.186

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$0.166

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$0.166

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Digiode

USA . 1,164 parts In-Stock

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$0.175

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Vyrian

USA . 2,147 parts In-Stock

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Bristol Electronics

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Corphita

USA . 2,242 parts In-Stock

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Corohmni

South Africa . 181 parts In-Stock

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$0.184

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A-Z Elektronik GmbH

Germany . 4,740 parts In-Stock

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Problanco Electronics

Mexico . 4,652 parts In-Stock

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Perfect Parts

USA . 4,180 parts In-Stock

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Kulean Microsystems

USA . 2,476 parts In-Stock

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Kepictronics

USA . 890 parts In-Stock

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UHIMA Technologies

Türkiye . 716 parts In-Stock

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TANS Electronics

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SupplyDigital Components

Austria . 86 parts In-Stock

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Overview

Unlock the power of efficiency with the NTMD4N03R2 by Onsemi, a high-quality Power FET that brings reliability and performance to your applications. Manufactured by Onsemi, a trusted leader in semiconductor technology, this N-CHANNEL transistor offers seamless switching capabilities for enhanced operational productivity. With a robust design and built-in diode, this FET ensures optimal functionality while maximizing energy efficiency. Say goodbye to downtime and hello to seamless operations with the NTMD4N03R2 by Onsemi.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material makes the product lightweight and durable, suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-Channel transistors generally have lower ON-state resistance and higher efficiency, making them a preferred choice for many switching applications.

Minimum DS Breakdown Voltage: 30 V

A higher breakdown voltage provides better reliability and protection against voltage spikes, making this transistor suitable for use in demanding environments.

Maximum Pulsed Drain Current (IDM): 12 A

The high pulsed drain current rating allows the transistor to handle sudden surges of current without damage, making it reliable for high-power applications.

Maximum Power Dissipation (Abs): 2 W

With a high power dissipation rating, this transistor can handle power efficiently without overheating, ensuring stable performance in demanding conditions.

Maximum Operating Temperature: 150 °C

The high operating temperature rating allows the transistor to function effectively in high-temperature environments without compromising performance.

Technical Specifications

Power Field Effect Transistors (FET) NTMD4N03R2 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

80 mJ

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

4 A

Maximum Drain Current (ID):

4 A

Maximum Drain-Source On Resistance:

.06 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G8

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

2 W

Maximum Pulsed Drain Current (IDM):

12 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTMD4N03R2 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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