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NTD78N03R-35

Onsemi

NTD78N03R-35 by Onsemi

NTD78N03R-35 by Onsemi is a Power FET with N-CHANNEL polarity, suitable for SWITCHING applications. It features a 25V DS Breakdown Voltage, 98A Pulsed Drain Current, and 0.009 ohm Drain-Source On Resistance. The transistor operates in ENHANCEMENT MODE with an EAS of 75mJ and can handle up to 76.9W power dissipation at a max temperature of 175 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Vyrian

USA . 1,056 parts In-Stock

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Digiode

USA . 1,012 parts In-Stock

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TANS Electronics

Latvia . 7,549 parts In-Stock

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SupplyDigital Components

Austria . 7,194 parts In-Stock

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Problanco Electronics

Mexico . 6,772 parts In-Stock

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Kulean Microsystems

USA . 5,060 parts In-Stock

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Corphita

USA . 940 parts In-Stock

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UHIMA Technologies

Türkiye . 541 parts In-Stock

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Corohmni

South Africa . 311 parts In-Stock

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Overview

Unleash the power of innovation with the NTD78N03R-35 by Onsemi. Crafted with precision and quality, this Power FET offers unparalleled performance in switching applications. With a single configuration and built-in diode, this N-channel transistor delivers exceptional value and efficiency. Whether you're looking to optimize your power management system or enhance your electronic designs, the NTD78N03R-35 is the perfect choice. Trust Onsemi's expertise and elevate your projects to new heights with this cutting-edge component.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material provides durability and protection for the transistor, making it suitable for various applications and environments.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and allows for more efficient operation in switching applications.

Minimum DS Breakdown Voltage: 25 V

The minimum breakdown voltage of 25V ensures reliable operation and protection against voltage spikes.

Maximum Pulsed Drain Current (IDM): 98 A

The high pulsed drain current allows for handling sudden surges in current, making it suitable for demanding applications.

Avalanche Energy Rating (EAS): 75 mJ

The high avalanche energy rating of 75mJ ensures robustness and reliability in handling high-energy transients.

Maximum Power Dissipation (Abs): 76.9 W

The high power dissipation rating allows the transistor to handle high power levels without overheating.

Maximum Operating Temperature: 175 °C

The high maximum operating temperature of 175 °C allows for operation in high-temperature environments without performance degradation.

Maximum Drain Current (ID): 11.3 A

The high maximum drain current rating ensures the transistor can handle large current flows without saturation.

Maximum Drain-Source On Resistance: 0.009 ohm

The low on-resistance ensures minimal power loss and efficient operation of the transistor in switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD78N03R-35 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

75 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

25 V

Maximum Drain Current (Abs) (ID):

85 A

Maximum Drain Current (ID):

11.3 A

Maximum Drain-Source On Resistance:

.009 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

98 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD78N03R-35 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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