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NTD5862N-1G

Onsemi

NTD5862N-1G by Onsemi

NTD5862N-1G by Onsemi is a Power FET with 60V DS Breakdown Voltage, 335A IDM, and 0.0057 ohm RDS. Ideal for applications requiring high drain current handling in enhancement mode operation. Package style: IN-LINE, Terminal finish: TIN, Case connection: DRAIN.

Median Price

$11.198

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Chip1Stop

Japan . 25 parts In-Stock

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$21.470

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$21.470

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Rochester

USA . 23 parts In-Stock

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-

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$0.925

1k+ parts

$0.767

10k+ parts

$0.684

23

-

$0.925

$0.767

$0.684

Distributors (In-Stock)

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Digiode

USA . 1,588 parts In-Stock

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$0.720

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$0.720

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Vyrian

USA . 7,564 parts In-Stock

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Corphita

USA . 1,666 parts In-Stock

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$0.682

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$0.682

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Corohmni

South Africa . 194 parts In-Stock

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$0.758

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194

$0.758

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AZTECH Wire

Italy . 324 parts In-Stock

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$15.610

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324

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Kepictronics

USA . 13,000 parts In-Stock

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SupplyDigital Components

Austria . 8,286 parts In-Stock

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Kulean Microsystems

USA . 7,737 parts In-Stock

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TANS Electronics

Latvia . 6,835 parts In-Stock

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Problanco Electronics

Mexico . 2,916 parts In-Stock

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UHIMA Technologies

Türkiye . 569 parts In-Stock

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569

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Perfect Parts

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GreenTree Electronics

Israel . 50 parts In-Stock

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Authorized Procurement Solutions

USA . 25 parts In-Stock

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Overview

Elevate your power management solutions with the NTD5862N-1G by Onsemi. This high-quality Power Field Effect Transistor offers reliable performance and efficiency, making it ideal for a wide range of applications. With its N-channel configuration and built-in diode, this transistor delivers exceptional value and benefits to customers looking for superior power control capabilities. Trust in Onsemi's expertise and experience in semiconductor technology to bring you cutting-edge solutions that meet your power needs effortlessly.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material in the package body provides good mechanical strength and insulation properties, making the product durable and reliable.

Configuration: SINGLE WITH BUILT-IN DIODE

Having a built-in diode allows for protection against reverse currents and voltage spikes, enhancing the overall reliability of the product.

Maximum Pulsed Drain Current (IDM): 335 A

The high maximum pulsed drain current capability indicates that this FET can handle high power applications with ease, making it suitable for demanding use cases.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can operate efficiently even in high temperature environments, ensuring reliable performance under extreme conditions.

Maximum Drain-Source On Resistance: 0.0057 ohm

The low on-resistance of 0.0057 ohm results in minimal power loss and heat generation during operation, making this FET efficient and suitable for high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD5862N-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

205 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (ID):

90 A

Maximum Drain-Source On Resistance:

.0057 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

335 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Element Material:

SILICON

Trade Compliance

NTD5862N-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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