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NTD5406NT4G

Onsemi

NTD5406NT4G by Onsemi

NTD5406NT4G by Onsemi is an N-channel power FET with a 40V DS breakdown voltage and 150A max pulsed drain current. Ideal for switching applications, it features a built-in diode, 0.01 ohm max RDS(on), and operates in enhancement mode.

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6

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1k+

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Chip Stock

USA . 480,000 parts In-Stock

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ACDS - Activité Composants Distribution Service

France . 11,894 parts In-Stock

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Vyrian

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ComSIT Distribution GmbH

Germany . 294 parts In-Stock

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ComSIT USA

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Digiode

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Benley Electronics

USA . 24 parts In-Stock

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$0.400

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AZTECH Wire

Italy . 364 parts In-Stock

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$14.910

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Perfect Parts

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Authorized Procurement Solutions

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Cyclops Electronics Ltd (Excess)

UK . 11,894 parts In-Stock

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Glotronic Ltd.

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Problanco Electronics

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Kulean Microsystems

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Kepictronics

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SupplyDigital Components

Austria . 3,429 parts In-Stock

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TANS Electronics

Latvia . 868 parts In-Stock

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UHIMA Technologies

Türkiye . 476 parts In-Stock

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Corohmni

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Corphita

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Overview

Enhance your power switching applications with the NTD5406NT4G by Onsemi. Crafted with precision and expertise, this N-CHANNEL Power Field Effect Transistor offers unparalleled reliability and performance. With a maximum drain current of 70A and a low on-resistance of 0.01 ohm, this transistor provides efficient and effective power management. Whether you're looking to optimize your automotive systems, industrial controls, or consumer electronics, the NTD5406NT4G is the ideal solution for all your switching needs. Trust Onsemi's exceptional quality and innovation to take your products to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material makes the transistor lightweight and durable, providing good protection against external elements.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have lower on-resistance and higher electron mobility compared to P-channel FETs, making them more efficient for many applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps protect the transistor from reverse voltage spikes, enhancing its reliability and preventing damage.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET provides fast switching speed and high efficiency.

Surface Mount: YES

Surface mount package makes it easy to integrate this FET onto a circuit board, saving space and facilitating automated assembly processes.

Maximum Drain-Source On Resistance: 0.01 ohm

Low on-resistance means lower power dissipation and less heat generation, increasing efficiency and reliability.

Maximum Operating Temperature: 175 °C

With a high maximum operating temperature, this FET can handle demanding environments and high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD5406NT4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

450 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

70 A

Maximum Drain Current (ID):

12.2 A

Maximum Drain-Source On Resistance:

.01 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

300 pF

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

150 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD5406NT4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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