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NTD4960N-1G

Onsemi

NTD4960N-1G by Onsemi

NTD4960N-1G by Onsemi is a Power FET with 30V DS Breakdown Voltage, 137A IDM, and 0.0127 ohm RDS(on). Ideal for SWITCHING applications, it features an N-CHANNEL configuration in a PLASTIC/EPOXY package with built-in DIODE. Operating in ENHANCEMENT MODE, it has a max temp of 175 °C.

Median Price

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Vyrian

USA . 3,710 parts In-Stock

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Digiode

USA . 1,278 parts In-Stock

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ComSIT Distribution GmbH

Germany . 525 parts In-Stock

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ACDS - Activité Composants Distribution Service

France . 450 parts In-Stock

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Bristol Electronics

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Dan-Mar Components

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AZTECH Wire

Italy . 1,068 parts In-Stock

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Metaverse IC Inc.

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QUARKTWIN TECHNOLOGY LTD

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SupplyDigital Components

Austria . 6,689 parts In-Stock

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TANS Electronics

Latvia . 3,570 parts In-Stock

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Corphita

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Kulean Microsystems

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UHIMA Technologies

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Corohmni

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Overview

Enhance your power management capabilities with the NTD4960N-1G by Onsemi, a high-quality N-Channel Power FET with a built-in diode. Ideal for switching applications, this transistor offers a maximum pulsed drain current of 137A and a low drain-source on resistance of 0.0127 ohm. With a durable plastic/epoxy package and operating temperature of up to 175 °C, this transistor provides reliability and efficiency for a wide range of electronic systems. Trust Onsemi's expertise in semiconductor technology and unlock the full potential of your power designs with the NTD4960N-1G.

Feature Benefit Bullets

Package Body Material - PLASTIC/EPOXY

The use of plastic/epoxy material for the package body provides insulation and protection to the internal components of the transistor, ensuring durability and long-term reliability.

Polarity or Channel Type - N-CHANNEL

N-channel FETs typically have better performance characteristics such as lower on-resistance and higher efficiency compared to P-channel FETs, making this product a suitable choice for various applications.

Minimum DS Breakdown Voltage - 30 V

The 30V breakdown voltage allows for reliable operation within a wide range of voltage levels, making this FET versatile and suitable for different circuit designs.

Maximum Pulsed Drain Current (IDM) - 137 A

The high pulsed drain current rating of 137A makes this FET capable of handling large transient currents, making it suitable for high-power switching applications.

Avalanche Energy Rating (EAS) - 51.2 mJ

The high avalanche energy rating of 51.2mJ indicates the FET's ability to withstand spike voltages and transient events, making it reliable in demanding operating conditions.

Field Effect Transistor Technology - METAL-OXIDE SEMICONDUCTOR

The use of metal-oxide semiconductor technology ensures high performance, low power consumption, and efficient switching characteristics, making this FET a reliable choice for various applications.

Maximum Operating Temperature - 175 °C

The high maximum operating temperature of 175 °C allows this FET to operate reliably in elevated temperature environments, making it suitable for industrial and automotive applications.

Maximum Drain-Source On Resistance - 0.0127 ohm

The low on-resistance of 0.0127 ohm results in reduced power losses and improved efficiency, making this FET ideal for high-current and high-frequency switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD4960N-1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

51.2 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (ID):

8.9 A

Maximum Drain-Source On Resistance:

.0127 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

137 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Finish:

TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD4960N-1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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