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NTB5860NT4G

Onsemi

NTB5860NT4G by Onsemi

NTB5860NT4G by Onsemi is a N-CHANNEL Power FET with 60V DS Breakdown Voltage, 520A IDM, and 0.003 ohm RDS(on). Ideal for power management applications requiring high current handling capabilities in a small outline package.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Chip Stock

USA . 57,000 parts In-Stock

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Vyrian

USA . 1,540 parts In-Stock

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Digiode

USA . 1,439 parts In-Stock

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Component Stockers USA

USA . 498 parts In-Stock

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$99.990

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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Kepictronics

USA . 13,000 parts In-Stock

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Kulean Microsystems

USA . 6,243 parts In-Stock

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Authorized Procurement Solutions

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Problanco Electronics

Mexico . 5,265 parts In-Stock

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SupplyDigital Components

Austria . 4,034 parts In-Stock

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Corphita

USA . 1,824 parts In-Stock

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TANS Electronics

Latvia . 1,072 parts In-Stock

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UHIMA Technologies

Türkiye . 500 parts In-Stock

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Corohmni

South Africa . 147 parts In-Stock

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Overview

Experience the power and reliability of the NTB5860NT4G by Onsemi, a top-tier manufacturer known for its superior quality and innovation. This N-channel Power FET with a built-in diode is the perfect choice for applications requiring high performance and efficiency. Whether you're in the automotive, industrial, or consumer electronics industry, this transistor offers unmatched value with its impressive durability, maximum drain current, and low on-resistance. Trust Onsemi to deliver cutting-edge technology that exceeds expectations and drives your success. Choose the NTB5860NT4G for unparalleled performance and peace of mind.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy as the package body material makes the product lightweight and durable, ideal for applications where weight is a concern.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their high efficiency and fast switching speeds, making this product suitable for applications requiring high performance.

Surface Mount: YES

The surface mount capability of this product allows for easy and convenient integration onto PCBs, saving space and simplifying assembly.

Minimum DS Breakdown Voltage: 60 V

With a minimum breakdown voltage of 60V, this FET can handle higher voltages without compromising performance or safety.

Maximum Pulsed Drain Current (IDM): 520 A

The high pulsed drain current rating of 520A allows for short bursts of high power, making this product suitable for applications with high peak power requirements.

Maximum Power Dissipation (Abs): 283 W

The high power dissipation rating of 283W ensures that the FET can operate at high power levels without overheating, making it reliable in demanding applications.

Maximum Operating Temperature: 175 °C

The high maximum operating temperature of 175 °C allows this FET to withstand elevated temperatures, making it suitable for applications with high temperature requirements.

Technical Specifications

Power Field Effect Transistors (FET) NTB5860NT4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

800 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

220 A

Maximum Drain Current (ID):

103 A

Maximum Drain-Source On Resistance:

.003 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

520 A

Sub-Category:

FET General Purpose Powers

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Element Material:

SILICON

Trade Compliance

NTB5860NT4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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